Used TEL / TOKYO ELECTRON Alpha 303i-K #293626328 for sale

ID: 293626328
Furnace Process: D-Poly Process pressure: 73 Pa, 133 Pa Process temperature: 510°C, 525°C, 530°C Boat operation: (2) Boat type Carrier ID Reader / Writer ASYST ATR9100 Furnace: Heater type: VMM-56-002 Mid temperature, (5) zones, 500°C - 1000°C MA901-8FK09-Z250A Temperature controller Wafer / Carrier handler: Wafer type: 300 SEMI STD Notch Carrier type: FOUP / 25-slots (16) Carriers Fork type / Material: 1+4 / Al2O3 Boat / Pedestal: (100) Wafers Boat material: SiC with CVD coat Boat type: 117-Slots ladder Pedestal type: Quartz Process tube: Material: Quartz Inner type: Straight Internal T/C type: Outer tube interior wall type Tube sealing: O-Ring seal Waves controller Front operation panel Front MMI and Gas Flow Chart (GFC) Signal tower, 4-colours Pressure display unit Gas cabinet exhaust display unit M560A Furnace temperature controller Vacuum system: Vacuum exhaust CKD VEC Vacuum pressure controller CKD VEC Valve Pressure controller: MKS Capacitance manometer Pressure monitor: MKS Capacitance manometer Pump monitor: MKS Capacitance manometer Gas distribution system: Type: Integrated gas system Tubing: Stainless steel No tubing bends Tube heater FUJIKIN Manual valve FUJIKIN Air-operated valve MYKROLIS Pressure transducer Soft backfill injector Manifold heater MFC: SiH4 / 3 SLM PH3 / 500 SCCM PH3 / 50 SCCM PH3 / 30 SCCM ClF3 / 5 SLM N2 / 3 SLM N2 / 5 SLM (x4).
TEL / TOKYO ELECTRON Alpha 303i-K diffusion furnace is a piece of semiconductor-processing equipment used in the manufacturing of high-performance semiconductor parts. The furnace is specifically designed for ion implantation, oxidation, andannealing processes. It boasts high-precision, high-speed production capabilities with low thermal oxide stress, achieving high-quality uniform implants up to 250 mm of wafer diameter. TEL ALPHA 303IK includes several advanced technologies for accurate and efficient control of all process parameters. These include the patented Advanced Power Control (APC) Equipment, which features a high-performance power supply for tightly controlling plasma characteristics and uniformity, as well as Double-Ti Diffusion (DTD) technology, which precisely controls gas flows and temperatures for uniform and repeatable results. The intuitive TELVision monitoring system provides real-time process monitoring and diagnosis. In addition, the Advanced Motorized Scanner (AMS) ensures high-precision, high-speed scanning of 25 mm wafers. TOKYO ELECTRON ALPHA 303 I K also utilizes a patented Direct Pyrolysis Reduction (DPR) Unit, enabling the diffusion furnace to use lower-temperature pyrolysis (chemical vapor deposition) processes with high throughput while avoiding cold-wall effects and process non-uniformities. In addition, the optional MEMS Expansion Kit allows for the processing of MEMS (microelectromechanical systems) at up to 10x magnification for accurate forming and etching. TEL ALPHA 303 I K comes with a comprehensive set of accessories for monitoring and controlling all aspects of the diffusion process. The unit includes an automated shutter machine for error-free start-up, an RF power generator for controlling plasma generation and impedance matching, an E-box resistivity controller for impedance control, an integrated controller for managing all tool functions, a load chamber for controlling substrate temperature, and a high-vacuum turbo pump for rapid pumps-up. To maximize product lifecycles and minimize process maintenance, TEL designed TEL / TOKYO ELECTRON ALPHA 303 I K with a robust build and advanced safety features, including an integrated safety asset that prevents accidents and damage to personnel, support structures, and the surrounding environment. The unit also features several helpful features for ease of use, including its design for easy maintenance and transportation. Moreover, the furnace is certified to meet the stringent requirements of the Sematech standards for optics and radiation safety. The state-of-the-art ALPHA 303 I K offers state-of-the-art performance to keep your production line running at its peak efficiency. Its combination of cutting-edge diffusion oven technologies and comprehensive accessories provide reliable, repeatable, and high-quality processing results, helping to keep your production costs low and product yields high.
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