Used TEL / TOKYO ELECTRON Alpha 303i-K #82006 for sale
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ID: 82006
Vertical Nitride Furnace, 12"
OHT Automation
12" SEMI Std – Notch
Wafer Notch Aligner
Carrier Type FOUP: Entegris A300
Buffer capacity: 16 FOUPS
Fork Material: 1+4 Al2O3 Standard
Boat type: (127) slots, 7mm pitch
Boat rotation: installed
Pedestal: Quartz + SiC
System Controller: WAVES
M560A Phase Furnace Temperature Controller
Heater Type: FTP VOS-56-003 4-zone / RT – 1050C
Process Pressure: 190mTorr
2-Boat type operation
Carrier I/D Reader: Asyst RF
Gas Distribution
Fujikin Manual Valve
Fujikin air-operated valves
Mikrolis filter
Kinetics (Unit) Digital MFC
MKS/Asahi Keiki Pressure Transducers
Soft backfill injector installed
Vacuum Exhaust Heated with MKS Heaters
CKD-VEC Vacuum pressure controller
Vacuum Gage – Pressure Controller MKS (Hot) Capacitance Manometer
Main Valve is CKD Combo
Water Cooled Trap
Rapid Cooling Unit
480VAC 3 phase 60 Hz, 250A
120VAC one phase 60Hz, 50A
Power box Top input entrance location
Gas System
N2O 0.5 SLM
N2 (spare) 5SLM
N2 (Spare 5SLM
SiH2Cl2 0.2SLM
NH3 2.2SLM
Pure N2 (130SLM)
N2 Purge Box
Pure N2 –3 1100SLM
Pure N2-4 500SLM
Rapid Cooling Unit
CDA
2007 vintage.
TEL / TOKYO ELECTRON Alpha 303i-K diffusion furnace is a high-performance, professional-grade furnace designed for single-wafer diffusion. It provides an ultra-stable platform for substrate delivery and processing. This furnace is designed to perform multi-layer etching and deposition on both small and large substrates, with a maximum wafer size of up to 8 inches. The heart of TEL ALPHA 303IK is its energy-efficient, high-temperature heating chamber, providing temperatures up to 1400°C for rapid thermal annealing and oxidation. It utilizes a direct drive, high-temperature quartz lamp array that provides uniform, consistent heat distribution across the entire surface of the wafer. The adjustable, stepped temperature profile allows accurate control of the temperature gradient throughout the furnace chamber. TOKYO ELECTRON ALPHA 303 I K features a heavy-duty mechanical frame with dual-ionsheild seals, ensuring uniform thermal and kinetic properties under high temperatures. It also comes with a suite of accessories including a robotic element, an array of automated sensors, an independent atmosphere supply system and an intuitive software package, allowing users to easily program their settings. The furnace is equipped with a variety of advanced safety features, including multiple temperature probes to detect hazardous temperature differences, pressure sensors to detect the possibility of part contamination, and a vacuum interrupt switch to stop the operation of the furnace in emergency situations. TOKYO ELECTRON Alpha 303i-K is fully integrated with E-Clean™ a leading precision cleanroom automation system, making it ideal for cleanroom environments as well as traditional manufacturing settings. Alpha 303i-K is designed to offer a reliable, repeatable, and cost-effective solution for advanced diffusion processes. With its cutting-edge design and advanced safety features, TEL / TOKYO ELECTRON ALPHA 303 I K diffusion furnace is the pinnacle of single-wafer diffusion machinery.
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