Used TEL / TOKYO ELECTRON Alpha 303i-K #9218065 for sale
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TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and accessory designed for custom and cost-effective diffusion processes. It provides a highly efficient and reliable equipment for users to achieve uniform impurity concentration throughout their wafers. TEL ALPHA 303IK is perfect for use in industries such as electronics device manufacturing, optics, power electronics, and MEMS fabrication. It ensures fast and consistent diffusion processes with adjustable temperatures ranging from 400 to 1,400°C. The advanced Quartz Ultra HD Technology contributes to uniform temperature distribution throughout the vacuum chamber, maximizing the accuracy of process results. The system features an extremely smooth, low distortion, and compact vacuum chamber, for quickly diffusion processes. The three stage pumping is aided by a wide range of vacuum pressure valves, including dry: 0.5Pa; turbo: 5Pa; and booster: 20Pa. The high-quality backing pump unit efficiently removes higher pressure gas and helps keep particle counts low. The robust and advanced design of TOKYO ELECTRON ALPHA 303 I K extends its durability, making it the perfect choice for long term use with consistent results. To further ensure robust processes, integrated interlocks and safety circuits provide comprehensive protection. ALPHA 303IK also allows a wide range of custom process designs. The machine has an automated substrate holder transport mechanism, which provides users with complete control over spot and line diffusion processes in a single tool, allowing for customization of their diffusion processes. This advanced asset also offers streamlined operation with intuitive graphical user interface (GUI). The GUIs provide comprehensive diagnostics information in real-time, allowing users to access and monitor their processes for efficient and effective results. Moreover, the software enables users to modify temperature and pressure settings from a remote location. To summarize, ALPHA 303 I K provides a reliable solution for efficient and cost-effective diffusion processes. It features a robust and user-friendly running tool, adjustable temperatures, and an intuitive GUI for comprehensive control over the process. The flexible setup of the model makes it the perfect choice for custom diffusion processes.
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