Used TEL / TOKYO ELECTRON Alpha 303i-K #9250260 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is a top-of-the-line diffusion furnace specifically designed for production of advanced semiconductors. It is engineered to offer superior temperature uniformity, stability, and repeatability of process results. The furnace is equipped with in-situ measurement systems such as Luminos Mass Flow Controller (MFC), Oxide Mass Flow Controller (OMFC), Hot-Wire Line Source (HWLS), Chromel/Alumel/Albaloy-1 Thermocouple and chromel/alumel/Albaloy-1/kapton Thermocouple to enable precise control of processing conditions. The Maximum-Temperature Range of TEL ALPHA 303IK is 1200°C. It has a quartz tube with One-two Pressure Control system providing a strong seal that is resistant to virus and dust to maintain maximum cleanliness and reduce the introduction of impurities into the processing environment. The diffusion furnace is equipped with a three-zone heating system - the Propane Zone (also known as the Infrared Zone), the Transfer Zone, and the Hot-Wire Zone. In the Propane Zone, Propane gas is used as the heat source to quickly raise the substrate to the target temperature. The Transfer Zone is then used to easily move the substrates in and out of the furnace. The Hot-Wire Zone utilizes the Hot-Wire Line Source to ensure temperature homogeneity. Additionally, the furnace is equipped with a Process Monitor (PM-1) system to provide valuable real-time feedback on the parameters of the diffusion process. This allows operators to accurately and efficiently monitor and adjust the operating temperature, gas flow, and equipment performance during the diffusion process. TOKYO ELECTRON ALPHA 303 I K also offers low-particle diffusion performance, precise temperature control, and an advanced user interface. This offers a fast and simple way to set up the diffusion parameters for each substrate or cleaning/etching task. Overall, ALPHA 303IK Diffusion Furnace is an efficient and reliable instrument designed to produce high-quality wafers with outstanding cost performance. It is the ideal solution for semiconductor device mass-production, making it an essential tool in the fabrication of modern integrated circuits.