Used TEL / TOKYO ELECTRON Alpha 303i-K #9281995 for sale

ID: 9281995
Furnace, 12" HTO / SiN 2005 vintage.
TEL / TOKYO ELECTRON Alpha 303i-K is a cutting-edge diffusion furnace and associated components designed for semiconductor wafer processing. It combines anodized aluminum oxidized tubes, linear induction heating elements, and advanced computerized controls to ensure superior wafer diffusion and annealing performance. TEL ALPHA 303IK has a 700-watt inductive power supply that offers linear inductive heating up to 2000°C. It also comes with a gas injection system, allowing for precise dispensing of a variety of chemicals. This is important for optimizing results in a variety of process applications, including nitride oxidation and implanting. The furnace is loaded securely through a high-pressure door clamp, ensuring maximum pressure is applied to the wafers while protecting against contamination. An automated temperature control system allows for precise and repeatable heating cycles, as well as the ability to set multiple thermal profiles for various process steps. Additionally, a built-in vacuum system ensures stability of the temperature and atmosphere within the furnace chamber. For added convenience, TOKYO ELECTRON ALPHA 303 I K includes a wafer locator option, allowing for secure placement of wafers into the furnace without manual loading. A wafer cassette can hold up to twelve wafers, making it useful for a variety of applications. In addition to superior diffusion, TOKYO ELECTRON ALPHA 303IK can also be used for oxide dielectric etching, reactive ion etching, and thermal oxide nitride etching. It includes a removable wafer box, allowing for easy transport and cleaning tasks. It also features a low temperature setting, allowing the furnace to be used for rapid cooling and annealing applications. ALPHA 303IK is a high-performance diffusion furnace that can be used across the broad range of semiconductor wafer-processing applications. It offers powerful and precise computerized control capabilities, as well as multiple options for wafer loading. It provides reliable, repeatable performance and long-term functionality, making it a reliable and cost-effective choice for semiconductor manufacturers.
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