Used TEL / TOKYO ELECTRON Alpha 303i-K #9297192 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and accessories which is suitable for versatile process applications such as high temperature annealing, CVD, and impurity diffusion. The furnace comes with a variety of innovative features for reliable and quality results. The furnace features a chamber temperature of up to 1000C with an adjustable heating and cooling rate from 10C and 1200C/min. The chamber is constructed from heavy duty graphite materials, with efficient thermal and electrical resistivity. This chamber construction ensures superior temperature uniformity with a maximum of +/- 5% over the entire temperature range. The diffusion furnace also comes equipped with a real-time temperature control system, with a combined controller and PID with unique auto-tuning function. This ensures precise temperature control and results in a highly uniform result over the entire temperature range. The chamber of TEL ALPHA 303IK is equipped with a temperature probe and gas inlets with a gas path that is designed to prevent clogging and provides superior gas flow uniformity. There are also special vent holes to reduce evaporated contaminants that could contaminate wafers. TOKYO ELECTRON ALPHA 303 I K also features a quartz rotating boat shelf and a loader system with a maximum capacity of 100 wafers. The quartz shelf is ideal for providing uniformity and heat distribution. The rotary shelf also ensures that the wafers are evenly spread out for enhanced uniformity. TOKYO ELECTRON Alpha 303i-K also features a large view window that can load from the outside. This is perfect for monitoring process temperatures and for manually adjusting the temperature without opening the chamber. The furnace also has a quartz substrate heater which can be controlled independently allowing for precise heating across the chamber. With its precision engineering and unique features, TEL / TOKYO ELECTRON ALPHA 303 I K provides exceptional quality and performance for diffusion process. The user-friendly interface, combined with efficient thermal and electrical properties, ensure reliable and quality results. This is an ideal choice for any laboratory or professional establishment seeking a high-precision diffusion furnace system.