Used TEL / TOKYO ELECTRON Alpha 303i-K #9381804 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is a quality diffusion furnace and accessory for semiconductor manufacturing. This equipment is capable of thermal processing temperatures up to 1200°C. It is constructed with an advanced diffusion furnace build, giving it extra-long service life and conformability with most materials in production. This furnace features state-of-the-art safety devices, fast heating power supply and advanced exhaust system, which together ensure safer operations and better efficiency. TEL ALPHA 303IK diffusion furnace is designed with three primary sections called chambers. The three chambers include the pre-load chamber, processing chamber and load lock chamber. The pre-load chamber houses a heating element powered by an induction power supply, temperature controller and high vacuum valve. All three chambers are isolated, sealed off and provide a controlled environment for performing different type of thermal processes. The processing chamber is equipped with a moisture-free chamber, infra-red heaters, electrical insulation and quartz tube. This chamber is used to control the temperature and environment necessary for thermal processes. The load lock chamber provides the necessary transfer chamber and pressure balance. This is necessary if there are any transportation requirements. In order to ensure that the quality and production standards are maintained, TOKYO ELECTRON ALPHA 303 I K is equipped with a set of sensors. These sensors include thermocouples, pressure sensors, pyrometers, temperature controllers and electrical testers. With these sensors, the operator is able to achieve maximum precision and efficiency by monitoring all conditions of substrate surface. The heat sink unit fitted to ALPHA 303IK is equipped with four quartz lamps which are able to absorb and transfer heat accurately and with minimal loss of energy. This type of heat sink machine ensures thermal processing stability, a homogenous temperature profile within the tool and less thermal cycling for less stress on wafers or substrate. Finally, ALPHA 303 I K is designed to fit most production sites since it has a compact and solid framework. The controller, gas lines and cooling water line are all integrated into the main body. This type of construction also reduces the time it takes to perform the setup and also lessens the overall cost. Overall, Alpha 303i-K is a high quality, efficient diffusion furnace and accessory used in semiconductor production. This versatile unit is equipped with a state-of-the-art safety device, fast heating power supply and advanced exhaust asset. It is designed with a set of three chambers allowing safe transfer, temperature and pressure control. Finally, the model features a unique heat sink equipment and compact construction for easy fitting on any production site.