Used TEL / TOKYO ELECTRON Alpha 303i-K #9381807 for sale

ID: 9381807
Wafer Size: 12"
Vintage: 2004
Furnace, 12" MTO Heater type: VMM-56-002 Gas: Pure N2, SiH4, N2O 2004 vintage.
TEL / TOKYO ELECTRON Alpha 303i-K diffusion furnace is a state-of-the-art thermal treating system that enables precise and accurate thermal processing of various semiconducting materials. This system is designed to be able to perform high temperature annealing of substrates in a controllable thermal environment. The 303i-K boasts an evenly distributed heated zone and an easy-to-operate panel that affords users a wide range of process options and temperatures up to 1200°C. The diffusion furnace can accommodate two-inch up to five-inch wafers and is capable of heating vertically, a process that creates better and more consistent results thanks to the improved heat-flow pattern, and vertical heating also helps protect the surface of the substrate from oxidation. The interlocked front door of the machine ensures complete safety while in use and ensures that the furnace properly cools down before it can be accessed. Additionally, the 303i-K offers fast cooling times and can be sealed with a cover shutter, which helps to reduce oxidation of the surface. A wide array of accessories are available to complement the operation of TEL ALPHA 303IK, including furnace plates, coils, limit switches and temperature monitor cables. A variety of elements can be chosen to facilitate the desired temperature setting, pulse cycle and uniform temperature distribution within the chamber. The 303i-K's Advanced Kinetics Control (AKC+) software also helps to precisely control each parameter and accurately track process results. This allows users to fine-tune the process for optimal performance and maximum throughput. Additionally, the machine has two in-situ electrical contacts for testing wafer-level resistance, which can be used to evaluate process results directly from the furnace. All in all, TOKYO ELECTRON ALPHA 303 I K offers reliable and precise thermal processing capabilities, user-friendly design, high temperature heating and a variety of substrate sizes for a wide range of materials. Combined with a selection of fully featured accessories and software, the 303i-K is the ideal diffusion furnace for a variety of high-tech applications.
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