Used TEL / TOKYO ELECTRON Alpha 303i-K #9381810 for sale
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ID: 9381810
Wafer Size: 12"
Vintage: 2004
Furnace, 12"
MTO
Heater type: VMM-56-002
Gas: Pure N2, SiH4, N2O
2004 vintage.
TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and accessory combination specifically designed for rapid thermal processing (RTP). This custom-engineered solution includes a temperature control equipment, a load lock system, and a top-loading process chamber. It is highly reliable, with advanced accuracy and stability, allowing users to achieve superior uniformity and optimal results in their RTP processes. The temperature control unit of TEL ALPHA 303IK consists of a large, color touchscreen interface, allowing for easy and intuitive manipulation of the furnace's heating and cooling cycles. The machine can be programmed to run from 300-1200°C, with an adjustable ramp rate of up to 200°C/min. This control tool also utilizes a PID algorithm for fast temperature regulation, allowing for superior accuracy and repeatability. Additionally, TOKYO ELECTRON ALPHA 303 I K's temperature range is designed for low-pressure operations, which minimize degradation of surface quality during the process. The load lock asset of TOKYO ELECTRON ALPHA 303IK is designed to provide quick and efficient loading of substrates into the chamber without having to cool down and warm up the model. This ensures that users can minimize the thermal cycle time while maintaining a consistent temperature regime, thus preventing potential damage to complex process modules and unstable substrates. An additional benefit of this equipment is that it allows for rapid interchangeability of parts, further decreasing cycle time and maintenance costs. The top-loading process chamber of ALPHA 303 I K is specifically designed for RTP. This system is highly accurate, with uniformity of about 2 to 5°C/zone, allowing for repeatable and reliable results every time. The chamber is also designed to decrease cooling time, allowing for faster turnaround between test runs. Additionally, the chamber size is customizable, allowing for any surface area to be treated with the same exposure. ALPHA 303IK is the perfect RTP unit, offering the best combination of accuracy, speed and scalability for your thermal processing needs. With its advanced temperature control machine, load lock tool and top-loading process chamber, this asset is essential for achieving superior results in all types of thermal processes.
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