Used TEL / TOKYO ELECTRON Alpha 303i-K #9381817 for sale

ID: 9381817
Wafer Size: 12"
Vintage: 2004
Furnace, 12" MTO Heater type: VMM-56-002 Gas: Pure N2, SiH4, N2O 2004 vintage.
TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and its associated accessories designed for various applications in semiconductor device manufacturing and related industries. It is a tool designed for accurate and efficient thermal processing of substrates. TEL ALPHA 303IK has a large heating chamber of 12 inches in diameter and 8 inches in height, allowing for a large quantity of substrates to be processed simultaneously. The equipment is heated via indirect quartz lamps for greater uniformity along the wavelength and for improved ergonomics. The top plate of the furnace is operated by a linear stage, allowing for precise motion control and accurate wafer positioning. The bottom plate is operated by a motorized four-axis stage to enable precise adjustment of the heating chamber temperature. The system is equipped with an advanced Lucent Technologies Guardian Ethernet-based automation controller, allowing for remote and hands-off operation. The controller also features an intuitive graphical user interface that provides simplified monitoring and process control. TOKYO ELECTRON ALPHA 303 I K utilizes a heated susceptor to perform processing at temperatures up to 1200 degrees Celsius and features an auto-tilt function that enables rotational movement while maintaining uniform substrate temperature. To facilitate cooling operations, the furnace has a helium-forced cooling unit to quickly cool down the chamber after processing is complete. In addition, TEL / TOKYO ELECTRON ALPHA 303 I K is equipped with a high-density Alkali Liquid Vaporizer to provide superior uniform film deposition. This machine is also compatible with various advanced oxide removal processes for improved dielectric properties. The instrument includes a Vacuum Chemical Vapor Deposition tool that enables the deposition of metal films with uniform properties for enhanced yield. All these components are packaged with a command-based software for easy automation and integration into customer systems. Overall, ALPHA 303IK is a complete tool for wafer processing and metal deposition, ideal for semiconductor device manufacturing and other industries related to electronics. This asset can provide accurate, efficient and reliable thermal and chemical processing for superior yields.
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