Used TEL / TOKYO ELECTRON Alpha 303i-K #9381848 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is a high-end diffusion furnace designed for wide range of applications in the industrial and laboratory markets. The diffusion furnace is a versatile equipment designed to effectively process semiconductor wafers efficiently, reliably and safely. TEL ALPHA 303IK features an advanced wafer processing system comprised of multiple chambers, allowing for multiple process steps to run separately or simultaneously. The unit has an advanced 3-zone heating machine, using a high power, multi-level thyristor power supply, to heat the chamber independently. The wafer carrier is a heated platform and is mechanically coupled to the processing chamber, allowing for a consistent temperature profile during wafer processing. The process chamber is designed with a direct radiant tube, which is able to reach temperatures up to 1200°C for diffusion or oxidation processes. The sealed process chamber is also designed for low particle counts, making it ideal for a variety of applications requiring a clean, contaminant free environment. In addition, the chamber features an advanced cooling tool, allowing for rapid cooling of the process chamber, and rapidly returning the chamber to a pre-programmed ambient temperature. TOKYO ELECTRON ALPHA 303 I K is able to sustain pressure of up to one atmosphere, and the asset's atmosphere purity is monitored continuously, as well as the process chamber's pressure. In addition, the user is able to control the oxygen concentration of the process chamber. TEL / TOKYO ELECTRON ALPHA 303 I K is designed with a wide range of user-friendly features, such as record-keeping of processes run, programmability for multiple wafer sizes, and recipe storage capability. It is also equipped with an advanced safety feature, where the model shuts off automatically if process parameters exceed their pre-programmed limits. Overall, Alpha 303i-K is an ideal diffusion furnace for a variety of industrial and laboratory applications, offering advanced wafer processing capabilities and enhanced user friendliness. This equipment will provide highly accurate and reliable results, allowing for highly efficient processing of wafers.