Used TEL / TOKYO ELECTRON Alpha 303i-K #9394521 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and accessories system designed for precise wafering and substrate manufacturing. It is suitable for a wide range of tasks, including annealing, oxidation, boron-doping, and metal-alloying. An advanced automatic control system with a variety of functions ensure top-level precision and repeatability. TEL ALPHA 303IK is equipped with a high-performance power supply and advanced temperature control module to ensure precise temperature control. The temperature range of the furnace ranges from room temperature to 1100°C with the highest temperature stability at ± 1°C. The temperature control is ensured through precise PID-automatic-temperature-control. The unit has an optional wafer transfer module, which can be used for quick substrate exchange between the process and cooling stages. The quick wafer exchange minimizes the wafer damage during the transfer process and improves overall production efficiency. The unit is also equipped with safety functions, such as an over-temperature alarm, an automatic gas purge function, and a process monitoring system. TOKYO ELECTRON ALPHA 303 I K offers advanced process control functions, such as a multi-position control circuit for precise temperature control. The programmable input/output interface allows users to tightly control the process parameters such as recipe, temperature, pressure, and time. In addition, it has an automatic pressure control function, which maximizes the utilization rate of the source gas. TEL / TOKYO ELECTRON ALPHA 303 I K employs a physical vapor deposition process to ensure repeatable and conformal film deposition. The chamber is designed to evenly distribute the source gas and generates a high degree of uniformity across the substrates. This ensures that the substrates are coated uniformly and at the desired depth. TEL / TOKYO ELECTRON ALPHA 303IK is a reliable and efficient equipment suitable for use in a wide range of industries, such as the semiconductor fabrication, photovoltaic modules, and MEMS fabrication. It is suitable for low- to medium-level fabrication needs and offers world-class precision, stability, and repeatability.