Used TEL / TOKYO ELECTRON Alpha 303i-K #9394526 for sale

TEL / TOKYO ELECTRON Alpha 303i-K
ID: 9394526
Wafer Size: 12"
Furnace, 12" D-Poly.
TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and accessory package equipment that is used to deposit a variety of semiconductor materials on wafers and other substrates. It is an advanced digital-controlled, vertical furnace system that supports multi-cycle process recipe programming. This unit is ideal for high-precision diffusion and/or dopant application tasks. TEL ALPHA 303IK is designed with a vertical profile that is able to reach maximum temperatures of up to 1100°C, with temperature stability and uniformity of ± 1°C across the working area. This is ensured through precise electric control of the internal furnace atmosphere distribution. In terms of safety, TOKYO ELECTRON ALPHA 303 I K is equipped with triple-muffled chambers to prevent potential oxidation or contamination. In addition, TEL / TOKYO ELECTRON ALPHA 303IK operates in high-throughput and is able to handle batches of up to 15 wafers with a maximum of 32 wafers per multi-cycle recipe. It is also able to operate with the gas of choice, allowing for doping with N2, Ar, H2, O2 and others as required. The machine has a vacuum cycle of -7 torr with a leak rate property of less than 1 x 10^-7 pa. TOKYO ELECTRON Alpha 303i-K also includes a number of accessories that aid the diffusion process. These include a plasma generator, quartz oven, particle filters, and safety filters. The tool is certified to meet SEMI 3, S2, and ESD safety standards. Additionally, TEL / TOKYO ELECTRON ALPHA 303 I K comes with a power consumption of approximately 13kW and a footprint of 78.7 x 80.3 inches (2 x 2.04 m). Overall, TEL Alpha 303i-K is an advanced digital-controlled vertical furnace asset that offers excellent performance for diffusion and/or dopant application tasks. It is equipped with a range of accessories and certified to meet stringent safety standards. This model is ideal for those looking for a reliable, high-performance solution for their diffusion needs.
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