Used TEL / TOKYO ELECTRON Alpha 303i-K #9394532 for sale
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ID: 9394532
Wafer Size: 12"
Vintage: 2009
Furnace, 12"
Process: Silicon nitride (SiN) deposition process using dichlorosilane‑based chemistry
2009 vintage.
TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and accessory that enables fast, precise, low-temperature thin-film deposition of various materials on substrates for use in semiconductor manufacturing. It is suitable for a variety of applications, including annealing, restoration, oxidation, and deposition of ultra-thin films. The machine's advanced control system provides precision control of parameters such as temperature profile, time, pressure, gas flow, and atmosphere composition. This allows for flexible and efficient production of high-quality, high-precision thin films. TEL ALPHA 303IK features a high-performance parallel extended-TEM (TEM) process module. This module allows for accurate control of process temperatures up to 1000°C and offers a large range of temperature profiles. It also features a furnace window designed to minimize heat loss and an in-situ temperature measurement system to ensure uniform temperature control throughout the process. With a wide variety of optional accessories available, TOKYO ELECTRON ALPHA 303 I K can be used for applications such as annealing, oxidation, and deposition of platinum, gold, and silicon oxide thin films. It can also be used for protecting electron emitter surfaces and controlling the surface roughness of materials. Additionally, the machine is compatible with multiple types of materials, including various metals, silicon wafers, GaN crystals, and glass. ALPHA 303IK is fast, efficient, and easy to install and use. It features a user-friendly touchscreen and various safety features, such as a grounded chassis, high-voltage isolation, and leak-test monitoring. Furthermore, it is compact and highly portable, making it an ideal choice for a large variety of production processes in various settings. Overall, Alpha 303i-K is a high-performance diffusion furnace and accessory designed to meet the needs of semiconductor manufacturers. With its advanced control system and wide variety of optional accessories, it enables fast, precise, and uniform thin film deposition, making it an ideal choice for a variety of applications.
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