Used TEL / TOKYO ELECTRON Alpha 303i-K #9394986 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is a diffusion furnace and accessorie. This diffusion furnace is equipped with a unique dual pocket design which helps optimized in-situ source gas circulation which provides improved source efficiency and good homogeneity during the diffusion process. It features a hot-wall loading chamber with a separate hot zone in the middle allowing one-directional inward source gas flow through the source inlet ports. This in turn forms an efficient flow pattern which increases uniformity for better process results. TEL ALPHA 303IK's dual pocket design also minimizes the thermal gradient between the source pocket and the rest of the chamber to minimize static pressure fluctuation and enabling more stable alumina and aluminum dopant deposition. TOKYO ELECTRON ALPHA 303 I K also features an easy to use programmable controller. This controller enables up to maximum four step programmable neutron flux modulation. As a result, it can respond quickly to variation in source activity while maintaining uniform source concentration over the entire wafer. The controller also allows for up to 4-zone temperature control with up to ±2°C accuracy, making sure that temperature is precisely maintained during the diffusion process. This diffusion furnace is designed to be energy efficient, using a three thermal stage heat treatment method for gradual recovery of pre-heat temperature and allows the user to adjust the recovery time period from 0 to 40 minutes. It also has a built-in auto-recovery feature which monitors various operational parameters and automatically restores the furnace to a specified starting condition. TEL / TOKYO ELECTRON ALPHA 303IK is coupled with a range of safety features to ensure the highest safety standards during operation. It is equipped with chamber leak detecting switches, thermocouple broken surveillance, radiation protection device, an interlock safety system, and emergency shut-off system, all of which help to guarantee reliable operation. Additionally, an inlet filter is installed to stop particles and other contaminants from entering the chamber and disrupting the diffusion process. In conclusion, TOKYO ELECTRON ALPHA 303IK is a notably reliable and energy efficient diffusion furnace and accessory that is designed to guarantee stable operation with optimal efficiency. Its in-situ source gas circulation, programmable controller with flux modulation, energy efficient heat treatment, and comprehensive safety features all make it suitable for microelectronics diffusion.