Used TEL / TOKYO ELECTRON Alpha 303i-K #9394989 for sale

TEL / TOKYO ELECTRON Alpha 303i-K diffusion furnace is an advanced large-scale implanter for semiconductor fabrication. This equipment is designed for efficient thermal processing of metals, ceramics, and other materials for microelectronic and related applications. It is designed with an open chamber allowing easy access to individual components. TEL ALPHA 303IK consists of three sections: the tray chamber, the lower control area, and the upper process area. The tray chamber features a preheat zone and annealing zone for controlled thermal processing. It is also fitted with removable trays that can accommodate a range of substrates. These trays are made of high-performance aluminum and have uniform heat distribution, allowing for low-temperature process steps to be completed quickly and efficiently. In addition, the trays feature an integrated cooling system, which enables them to be cooled off quickly when changing between processing steps. The lower control section is equipped with an advanced air recirculation unit that ensures the integrity of the process environment. This is achieved bya two-stage filter machine with HEPA and ULPA filters, which prevents contamination from outside sources. This ensures that the process environment is kept free from foreign particles. It is also equipped withan intelligent user-friendly monitoring tool, which provides detailed information about the exact conditions and parameters for each process step. The upper process area of TOKYO ELECTRON ALPHA 303 I K consists of a gas inlet manifold, a quartz heated substrate holder, and power controllers. The substrate holder features apertures for gas injection and cooling, and it is designed to maximum the heating rate and achieve uniform heating. The power controllers are used to control the heating element's temperature, allowing for efficient and uniform thermal processing. In addition to the main asset, there are a number of accessories available, such as the optional susceptor control board for setting of preheat and annealing temperatures, optical pyrometer, and the Spectrum Imaging Model. This equipment is used for automated optical detection and analysis of the microstructures of the substrates after processing. Overall, ALPHA 303IK diffusion furnace can provide efficient thermal processing of metals, ceramics and other materials for microelectronic applications. It is designed with an open chamber, allowing for easy access to individual components. The system is further enhanced with an advanced air recirculation unit, which ensures the integrity of the process environment, and a number of accessories, which allow for greater precision when performing various processing steps.