Used TEL / TOKYO ELECTRON Alpha 303i-K #9394990 for sale

TEL / TOKYO ELECTRON Alpha 303i-K is a precise and reliable single-wafer diffusion furnace and accessory equipment that is utilized in the semiconductor manufacturing process. Specifically, the 303i-K can be used for annealing, dopant diffusion, and crystallization processes of various materials (e.g. silicon wafers, gallium arsenide wafers, etc.). The furnace utilizes an infrared heating system, which generates highly precise and uniform temperatuers, making it possible to shortens thermal cycle time. Additionally, the 304i-K has a robust and flexible option set that allows users to conduct multiple processes at once. This includes running multiple wafers at the same time, customizing the temperature profile, and depending on the material, the option for either oxide or nitride annealing. The 303i-K comes with a unique bucket loading and unloading unit, so that multiple wafers can be loaded and unloaded simultaneously. Additionally, the temperature of the chamber is stabilized quickly, ensuring fast cycle cooling and annealing processes. The machine also has a monitoring tool that enables engineers to observe wafer processing steps and check process conditions status in real-time in order to reduce wafer failure and prevent process contamination. To ensure maximum safety, the 303i-K runs with a clean air asset, which creates and maintains a protective atmosphere. This maintains a controlled level of cleanness in the chamber and also helps in reducing wafer degradation. Additionally, the model performs self-diagnosing of its functions as well, which helps the operator in determine any performance issues before they occur and cause damage. In terms of specs and performance, the 303i-K has a loading capacity up to twelve inch wafers and operates in a temperature range of 100,000-1400°C. The furnace is also equipped with software controls, offering users programming options such as maximum power up, maximum frequency down, variable thermal ramp, and others for greater customization. In conclusion, TEL ALPHA 303IK is a precision single-wafer diffusion furnace and accessory equipment with a variety of features designed to make the process of annealing, dopant diffusion, and crystallization safe and efficient.