Used TEL / TOKYO ELECTRON Alpha 303i-KVC #9381849 for sale

TEL / TOKYO ELECTRON Alpha 303i-KVC is a diffusion furnace for critical semiconductor device manufacturing and associated services. Designed to operate in high vacuum environment, TEL Alpha 303i-KVC utilizes advanced gas management technique to help minimize oxide contamination. The furnace features a high-efficiency cold wall design, with an internal tungsten envelope and an extended oriel shield for focus on uniform temperature gradient, while reducing particle loss. The internal tungsten envelope also ensures superior temperature uniformity with minimal temperature variations from one zone to another, which is beneficial for precise controlled diffusion treatments. The fused silica pipe feature of the furnace's design helps provide excellent process gas flow control for a high quality processing environment. TOKYO ELECTRON Alpha 303i-KVC is also designed to provide efficient source & drain evacuation, providing for an uninterrupted material flow to prevent oxidation, thereby improving device yield. To ensure that the extremely high source & drain pressure is maintained, the chamber has digital pressure and flow control, with a choice of inlet / outlet pressures ranging from 5 to 250 millitorr. Additionally, Alpha 303i-KVC includes a CVD-tolerant AMAT™ wrap-around susceptor support, making it ideal for CVD/ALD applications and reducing chamber maintenance by suppressing particle concerns. The CVD-tolerant wrap-around susceptor also helps to improve uniformity of film deposition and etch results. The advanced process control system ensures consistent treatments in repeatable processes and easy to use programmable functions for single and multi-layer applications. To ensure optimum process quality and repeatable process results, TEL / TOKYO ELECTRON Alpha 303i-KVC is designed to include advanced diagnostics and monitoring, including real-time and post process monitoring via closed-loop pressure regulation and load sequencing. The process control also includes data logging of both wafer-level and process parameters for extensive reporting & analysis. Overall, TEL Alpha 303i-KVC is an ideal diffusion furnace for critical semiconductor device manufacturing and associated services, providing an advanced processing environment for a consistent and repeatable results.