Used TEL / TOKYO ELECTRON Alpha 303i-KVCN #9381859 for sale
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ID: 9381859
Wafer Size: 12"
Vintage: 2005
Furnace, 12"
MTO
Heater type: VMM-56-306
Gases: DCS / N2O / SiH4
2005 vintage.
TEL / TOKYO ELECTRON Alpha 303i-KVCN diffusion furnace and accessory equipment offers a wide range of options for advanced thermal processes that include silicon wafers and compound semiconductor materials. It is a reliable and robust system that is designed for reliability and repeatability of thermal processes. TEL Alpha 303i-KVCN enables precise temperature control and also offers numerous other features that make it one of the more advanced systems available. The unit consists of a main chamber that is easily accessible to service personnel through removable access panels, a center-case/buffer chamber, and a front-end multiport vacuum gate valve with encased klystron. The main chamber is designed with superior insulation and temperature uniformity for effective temperature control. The machine can accommodate up to nine 2-inch wafers simultaneously and is well-suited for processes such as epitaxy, CVD, oxides, and nitrides. TOKYO ELECTRON Alpha 303i-KVCN offers exceptional control of temperature and pressure profiles with its advanced temperature controller and pressure controller. The temperature controller provides precise control of the temperature in the main chamber and ensures accurate temperatures for accurate results. The temperature control can be customized to the substrate material and parameters, which increases efficiency and reduces the need for manual intervention. The pressure controller adjusts the pressure profile automatically based on the characteristics of the process to optimize the temperature profile and enable more precise processing. Alpha 303i-KVCN also comes with a host of advanced safety features that make it one of the safest systems available. It includes an automatic temperature control tool that shuts off the source of heat in case of an emergency, a manually resettable safety fuse, and an emergency shut-off switch. These features protect both personnel and equipment, and ensure the safe operation of the asset. TEL / TOKYO ELECTRON Alpha 303i-KVCN also offers a range of additional accessories that enable better process control and increased flexibility. These accessories include a load-lock model, a film-grade sample changer, an automated process monitoring equipment, and a programmable wafer holder. Other optional components include a photoresist system and a wafer-manipulation unit. TEL Alpha 303i-KVCN diffusion furnace accessory machine is a reliable and robust tool that offers tremendous potential for a variety of thermal processing applications. The asset offers exceptional control of temperature and pressure profiles with its advanced temperature controller and pressure controller. The model also includes an array of safety features, additional accessories, and flexible programming capabilities. With its high-quality construction, reliability, and flexibility, TOKYO ELECTRON Alpha 303i-KVCN is an excellent choice for companies looking for an advanced thermal processing equipment.
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