Used TEL / TOKYO ELECTRON Alpha 303i Nitride #293596434 for sale

TEL / TOKYO ELECTRON Alpha 303i Nitride is a diffusion furnace and accessory designed for the semiconductor industry. It has been designed to meet the needs of the most demanding processes and is used for a wide range of applications including deposition and etching of thin films, surface treatments, oxidation, and nitride treatments. TEL Alpha 303i Nitride is a high-performance diffusion furnace that uses a vertical direct-heated hotzone equipment and vertical access volume. This configuration offers precise thermal uniformity, excellent temperature stability and accurate uniformity of temperature distribution at the wafer level. The use of a vertical hotzone heating system and an expanded access volume maximize the uniformity of uniform temperature distribution at the wafer level and improve process and product yield. TOKYO ELECTRON Alpha 303i Nitride is equipped with the latest in temperature control technology, allowing for precise temperature setting, ramp rate control and furnace cycle control. It comes with a touch screen controller that allows for easy monitoring and setting of the process parameters. It is also equipped with a programmable logic controller (PLC) for the automated setting and control of process parameters. The hotzone is made of an electrically conductive material which serves as the heat source, further maximizing heat transfer and thus improving thermal uniformity and temperature stability. The hotzone is also equipped with an anode assembly that helps to control and regulate electrical current which is used to control temperature. Alpha 303i Nitride also comes with safety features to ensure the safety of process operators. It has ambient protections such as an over-temperature alarm, explosion and fire alarm, and emergency power shutoff, in addition to an automated interlock unit that prevents the opening of the hotzone while the furnace is operated. TEL / TOKYO ELECTRON Alpha 303i Nitride machine is designed to offer maximum process flexibility. It can handle a wide range of different wafer types and sizes, along with various process recipes for nitride treatment. It is also designed for quick and easy maintenance, with a simple one-touch calibration and a variety of diagnostic tools to ensure process stability and superior product yields. Simultaneous dual wafer alignment is also available for double-sided nitride coating. In conclusion, TEL Alpha 303i Nitride is a high-performance diffusion furnace and accessory designed for the semiconductor industry. It is equipped with the latest temperature control technologies and safety features to ensure maximum safety and process stability. It is able to handle a wide range of wafer types, sizes, and process recipes for nitride treatment, offering maximum process flexibility and superior product yields.