Used TEL / TOKYO ELECTRON Alpha 303i Nitride #293638695 for sale

TEL / TOKYO ELECTRON Alpha 303i Nitride is a diffusion furnace and accessorie designed for use in semiconductor processing applications. This diffusion furnace features a diffusion temperature range of 1600°C to 3000°C and a nitrogen ambient up to 1050°C. Its uniformity and max temperature of 960°CAE verified and optimized with in situ thermocouple measurements. The furnace also offers a rapid high temperature ramp-up and cool-down capability, allowing users to save time and energy. This diffusion furnace comes with a variety of advanced features and supports the processing of materials in a wide range of applications. It offers a high throughput of wafers with a high Cpk ranking, allowing users to achieve a high yield. The furnace is equipped with a unique controller which utilizes advanced PID and Fuzzy Logic algorithms for precise temperature and atmosphere control. The exhaust system of TEL Alpha 303i Nitride is designed to limit particulate contamination and provide stable operation over extended periods of time. The furnace operates with ultra-low gas pressures designed for high process yields, as well as low-temperature sintering applications that require low outgassing. Additionally, TOKYO ELECTRON Alpha 303i Nitride features a hot wall design for improved temperature uniformity and enables tool-to-tool transfers with no additional cooling. It also comes with a multi-stage ambient control system to ensure the elimination of background gases from the atmosphere. Alpha 303i Nitride has a range of accessories that support a variety of processes including oxide, nitride, and polysilicon deposition, oxide etch, metallization, and other related processes. Such accessories include stationary range linear motion stages, mid-range linear motion stages, as well as susceptors and advanced temperature control systems. It also comes with an LCD touch-screen display, allowing users to easily monitor the status of their process. TEL / TOKYO ELECTRON Alpha 303i Nitride is the perfect choice for a variety of semiconductor processing applications. It offers excellent performance, precise temperature and atmosphere control, and a range of advanced features and accessories. TEL Alpha 303i Nitride ensures high yields at competitive costs, and is ideal for advanced research and development projects.