Used TEL / TOKYO ELECTRON Alpha 303i Nitride #293655836 for sale

TEL / TOKYO ELECTRON Alpha-303i Nitride furnace is a high-performance substrate processing equipment. It is ideal for diffusing various materials into silicon and other semiconductor substrates, and is capable of all areas of semiconductor device processing from ion implantation to oxidation and nitride applications. In terms of technical capabilities, TEL Alpha-303i Nitride Furnace has a maximum temperature of 1250°C, with a maximum thermal homogeneity of ±5°C. It also has a temperature uniformity of ± 0.9°C in a 70 x 70 mm area, and a uniformity of ± 2.2°C in a 140 x 140 mm area. The system is capable of maintaining a thermal history for over 150 thermal cycles, and may be used for high volume production issues. Its highly reliable integral heater unit ensures a maximum temperature control accuracy of ± 0.2°C. The machine is equipped with a range of advanced features such as a pyrometer with a remote viewing tool, and a gas flow control asset. These allow for accurate control of nitride and other processing from chamber to wafer level. The Nitride furnace is also capable of controlling doping while factoring in temperature. This is done by manipulating the balance between the flow of nitrogen and the flow of silane source gas. It also includes an advanced quartz lower electrode configuration, designed for improved uniformity. TOKYO ELECTRON Alpha-303i Nitride furnace is a reliable and powerful substrate processing tool. Its advanced features ensure a wide range of high-precision processes, and it takes advantage of the latest semiconductor device and crystal growth technologies. Its temperature control accuracy and thermal homogeneity ensure consistent medium-to-high volume production. It also uses advanced sensors and automated control systems to ensure maximum safety and quality of process results.