Used TEL / TOKYO ELECTRON Alpha 303i #293592993 for sale

TEL / TOKYO ELECTRON Alpha 303i is a diffusion furnace and associated accessories capable of performing a wide range of semiconductor processing tasks. Using tungsten halogen lamps and a gas mixture, TEL ALPHA-303I is capable of achieving temperatures up to 1250°C, an impressive feat for its size. The built-in temperature controller and programmable logic controller (PLC) allow for precise, tailored processing temperature control. TOKYO ELECTRON ALPHA-303 I is equipped with a special process chamber for thermal and chemical vapor deposition, trichlorosilane, or wet etching. This upgrade makes it possible to deposit or etch silicon or aluminum compounds, or diamond-like carbon films that can enhance electrical and optical properties. TEL ALPHA 303 I also offers the ability to deposit or etch various metals such as aluminum, silver, nickel, and titanium. TOKYO ELECTRON ALPHA 303 I is also equipped with an electric power supply system, allowing it to operate at higher current and voltage levels than most other diffusion processes. This allows for manual or programmable control of current and voltage to achieve faster processing times, as well as increasing the rate of deposition during lateral diffusion processes. Furthermore, TEL ALPHA-303 I can be used in a variety of processes such as ion implantation, lithography, and dry etching. The high temperature and vacuum capabilities of TOKYO ELECTRON Alpha 303i are advantageous for these processes due to the improved thermal uniformity, higher deposition rate, and reduced contamination. Finally, a Single Wafer Load Lock System (SWLLS) can be attached to TOKYO ELECTRON ALPHA-303I to further improve the diffusion furnace's capabilities. This system allows for rapid, uniform processing of multiple wafers with minimal exposure to air, making it a great asset for research and development purposes. In conclusion, ALPHA 303 I diffusion furnace is a powerful and versatile tool for semiconductor processing. Its high temperature and vacuum capabilities, coupled with its ability to process multiple wafers at a time, make it an attractive choice for research and development projects.