Used TEL / TOKYO ELECTRON Alpha 303i #293606036 for sale

TEL / TOKYO ELECTRON Alpha 303i
ID: 293606036
Vertical furnace Process: Oxide anneal.
TEL / TOKYO ELECTRON Alpha 303i is a digital diffusion furnace designed for the production of specialized substrates and components in the semiconductor industry. This equipment is engineered to provide highly precise and efficient results with minimal input. The furnace is composed of a CVD process chamber housed within an annealing chamber. This provides users with the ability to anneal, dry and cool components quickly and easily. This, in turn, increases production speed and efficiency. TEL ALPHA-303I utilizes PrecisionPattern Technology to provide precision results with advanced thermal uniformity. Precise control of CVD and annealing parameters is achieved through the integrated ThinFilm Pattern Control System. The ThinFilm Pattern Control Unit enables users to create accurately reconstructed 3D shapes with minimal intrusion into the substrate material. As a result, users will be able to maintain high substrate quality through consistent depth, uniformity, and surface quality. The furnace includes an intuitive HF power control machine, allowing users to control RF frequencies and power outputs to further optimize production processes. The HF power control tool also ensures patterns are precision-corrected without any distortion. TOKYO ELECTRON ALPHA-303 I also includes a revolutionary temperature control asset that is more advanced than those of previous models. Its temperature control model provides a temperature uniformity of ±3°C at the wafer surface, even in the presence of high heat load. This enables highly precise operations and keeps power consumption low. In addition, a gas supply equipment helps to ensure the application of precisely regulated reactive gas, thus promoting efficient and uniform processing. TOKYO ELECTRON ALPHA-303I also boasts enhanced safety features to ensure the safety of operators and users. These features include an auto-gas shutoff system, temperature auto-stop function, and an emergency secondary gas supply unit. In conclusion, ALPHA 303 I is a highly advanced diffusion furnace that enables rapid, precise, and efficient processing. Its integrated ThinFilm Pattern Control Machine and HF power control tool enable uniform and precise patterns without distortion. Its temperature management asset offers superior temperature uniformity while its advanced safety features keep users safe.
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