Used TEL / TOKYO ELECTRON Alpha 303i #293635550 for sale

TEL / TOKYO ELECTRON Alpha 303i is a diffusion furnace and its accompanying accessories designed for the process of ion implantation. This highly efficient device features a short process time, improved uniformity of wafer surface, and excellent uniformity of distribution. TEL ALPHA-303I can accommodate up to six wafers at a time, making it possible to process a large amount of material in a short time frame. The furnace utilizes direct current (DC) power to create a uniform surface concentrations and is equipped with an RF power source to reduce plasma production. A unique quartz chamber design is utilized to minimize the surface contamination in the resultant wafer. The adjustable control panel allows the operators to adjust parameters such as the evaporator temperature, the rate of diffusion furnace loading, and the diffusion susceptibility. TOKYO ELECTRON ALPHA-303 I also features auto-carrier compatibility, allowing for the use of compatible tool kits with varying wafer diameters. This flexibility allows for a wide range of specimens to be processed without the need for retooling. Additionally, an intuitive user interface facilitates trouble shooting and other operating activities. TEL / TOKYO ELECTRON ALPHA 303 I also includes a special nitrogen atmosphere module, which is ideal for protecting sensitive devices against contamination and oxidation. The atmosphere module allows for precise control of the atmosphere conditions, enabling a high level of wafer yield. The furnace can be set up in both single and dual port operation, and features an exhaust logging equipment for tracking the results of critical process steps. TEL ALPHA-303 I offers a variety of cutting-edge options for wafer surface treatment, including anodic bonding, molecular bonding, and fused deposition. These processes provide the necessary cleanliness and surface finish for a successful implant process. In addition, a self-diagnosis system is available to detect any errors in the process and enable immediate correction. Overall, TOKYO ELECTRON ALPHA 303 I is an advanced diffusion furnace and associated accessories that is designed to deliver superior performance and results in the implantation process. The device incorporates an intuitive user interface and residual logging unit, enabling high-quality results and shorter cycle times. The flexibility of this machine allows for multiple wafers to be processed in a short time frame with improved results overall.