Used TEL / TOKYO ELECTRON Alpha 303i #293658165 for sale

TEL / TOKYO ELECTRON Alpha 303i is a diffusion furnace designed specifically for semiconductor applications. It is a compact, single-axis equipment that can be used to add dopants to wafers to increase the conductivity of the material. TEL ALPHA-303I has an integrated furnace chamber, which is temperature-controlled and vacuum-tight, allowing for accurate and consistent processing temperatures. Its secure interlocks and safety systems ensure operator safety during operation. TOKYO ELECTRON ALPHA-303 I offers the most flexibility for diffusion applications, including the ability to set multiple dwell times for different gases and gas mixes. The process time is accurate and repeatable, with an adjustable cooling rate providing precise control of the temperature profile. The vacuum performance of ALPHA-303I is excellent, with a base pressure below 1 Torr and high leak rate up to 5x10^-3 Pa-m^3/sec. It also features lamps that continuously monitor the drive's cleanliness. TOKYO ELECTRON Alpha 303i works with a wide range of substrates, including quartz, silicon and aluminium. The susceptor can be adjusted to fit the specific substrate size. The gas manifold has separate supply and exhaust lines with control over flow rates and flow profile. TEL / TOKYO ELECTRON ALPHA-303 I is capable of high-temp processes, up to 1100 °C at 100Torr. It can also provide rapid thermal processing at temperatures up to 1250 °C. ALPHA-303 I includes a sequence control program for single wafer processing and batch processing. It allows the user to design specific sequences and repeat processes. The system also offers remote monitoring and data logging capabilities, allowing the user to check the temperature profile and unit status from virtually anywhere. ALPHA 303 I is a reliable and easy-to-use diffusion furnace machine. It offers superior vacuum performance and fast cycle times while ensuring process repeatability and reliability. With its built-in safety features and flexible automation capabilities, it is ideal for a wide range of semiconductor-based applications.