Used TEL / TOKYO ELECTRON Alpha 303i #293660114 for sale
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ID: 293660114
Vintage: 2007
LPCVD Furnace
Process: TEOS
Heater: VMM-56-002
FUIIKIN Air valve
APC: CKD
Gas: N2-1, Pure N2-1, O2, TEOS CG100, N2-2
Power supply: AC 208V, 3-Phase, Single-Phase
2007 vintage.
TEL / TOKYO ELECTRON Alpha 303i is a diffusion furnace and accessory utilized for producing high-purity semiconductors and other materials at high temperatures. TEL ALPHA-303I is capable of reaching temperatures up to 1250 degrees Celsius and is equipped with an electric resistance furnace and a built-in fan for cooling. TOKYO ELECTRON ALPHA-303 I also features a gas filtration system that is capable of maintaining the purity of the chamber by eliminating microscopic dust particles. The entire apparatus is constructed out of high-grade stainless steel and is equipped with an insulated door to maintain temperature stability and an advanced safety system for operator protection. The furnace utilizes an eddy-heating method to achieve uniform heating and temperature uniformity within the furnace. The eddy-heating method utilizes a gas line, gas injection, and a vibrator-type stirrer responsible for combining the gas from the line and the injection nozzle to create a form of eddy current. This eddy-heating method allows for a smoother rise in temperature as well as a quicker heatup time. ALPHA-303I has an interior volume of 50 liters and works with various gases including oxygen, methane, argon, and nitrogen. It is also compatible with several charge materials such as silica, silicon compounds, alumina, nitride, and carbides. Additionally, TEL ALPHA-303 I also has an Automatic Zone Setting (AZS) function which can be used to set different conditions, such as temperature, gas, and substrate types, for each process zone within the furnace. Using TEL / TOKYO ELECTRON ALPHA-303I, users can achieve clean and superior-quality products, such as semiconductors, solar cells, and other electronics. The sophistication and precision of Alpha 303i allows for uniform heating and cooling on every single wafer, leading to improved product quality and yields. The ability to set different conditions for each process zone further enhances this product's capabilities and offers users the ability to customize the machine's functionality to their specific needs. Overall, TEL / TOKYO ELECTRON ALPHA 303 I is a powerful diffusion furnace and accessory designed for meeting the needs of the modern manufacturing industry. Its ability to handle multiple substrate materials and gases makes it a versatile and reliable tool for producing a wide range of high-quality, flawless products.
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