Used TEL / TOKYO ELECTRON Alpha 303i #293758336 for sale

TEL / TOKYO ELECTRON Alpha 303i is a state-of-the-art semiconductor processing solution featuring an advanced directly coupled dual chamber diffusion furnace equipment. This solution helps make manufacturing of highly advanced semiconductors more efficient, faster and reliable. The furnace's unique design maximizes the use of both chamber simultaneously and helps reduce contamination due to its cornerless design. TEL ALPHA-303I is a fully automated system with integrated robotic load lock. This loadlock minimizes the chances of chamber contamination while loading and unloading the parts. The customized software included with the unit simplifies the entire process and helps organize multiple sequences faster and easier. TOKYO ELECTRON ALPHA-303 I is designed to provide superior performance, better uniformity and optimum precision. The furnace's multi-confined processing environment provides excellent uniformity and temperature stability even in harsh, challenging environment. The burner inside the compact chamber is capable of delivering the highest transfer efficiency among competitive systems and optimal deposition rate. The advanced, fully capable TEMI-2 controller incorporated into TOKYO ELECTRON ALPHA 303 I enables users to securely perform data analysis and rapid real-time process control. The controller is also equipped with state of the art features such as auto/manual on-the-fly chamber tuning capabilities, multiple unit management and real-time in-situ measurement. Alpha 303i is compatible with a wide range of substrates because of its large process area and modular design. This makes it an ideal choice for different processes, like doping, annealing, PVD and CVD. The furnace is also designed with advanced safety features, including exhaust machine, thermal limiters and a safety interlock shut off tool. Overall, TEL / TOKYO ELECTRON ALPHA-303I is an advanced, versatile and reliable diffusion furnace asset that offers superior performance, uniformity and precision. With its robust design, user-friendly interface and advanced safety features, this model is capable of providing successful deposition processes in a variety of regulated industrial sectors.