Used TEL / TOKYO ELECTRON Alpha 303i #9099381 for sale
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ID: 9099381
Vertical diffusion furnace, 12"
Process: TEOS
(1) Heater element Model: Mid-Temp VMM-56-002 5zone/500-1000
Process Condition: LP
Maximum Operating Temperature: 1000°C
N2 Load Lock: Yes
Wafer Type: 300 SEMI STD-Notch
Qty. of Production Wafers: 117 slots Ladder
Boat Operation: (2) Boat Type / (2) Boat Operation
Software Version: 2.06
Furnace:
(1) Loading Area Light: White (LED)
Force Air Cooling system: None
Side Maintenance: None
(1) O2 Density control: NGK SH-304 STANDARD
(1) N2 Boat shower wafer cooling: installed
(1) Furnace Temperature Controller: M560A
Wafer/Carrier Handling:
Carrier Type: FOUP (25) slots (STD)
Carrier Stage Capacity: 16
(1) WTU Type: 1+4 Edge Grip
WTU alignment: None
WTU Teaching method: None
Gas Distribution:
IGS Maker / Type: AREA
IGS MFC Maker / Type: AREA (Gas Panel)
IGS Press Transducer Maker / Type: NAGANO
Exhaust:
Vacuum Gage - 2 torr: None
(1) Vacuum Gage - 10 torr: MYKROLIS CMLH-31-150S06
Vacuum Gage - 100 torr- None
(2) Vacuum Gage - 1000 torr: MYKROLIS CMLH-11-150S06
(1) Main Valve: MKS-99C1274
(1) Pump Maker/Model: EDWARDS IH-1800
Low vacuum valve: None
(1) Trap: Disk Trap
(1) Vacuum Pressure Controller: N2-ballast
Reactor:
(2) Process Tube (LP): Outer: ID448xH1360, Inner: Straight H1340
(2) Outer/Inner Tube Material (LP): Quartz
Inner Tube Type (AP): None
(1) Inner T/C: Outer Tube interior wall type
(2) Boat Material/Type: Quartz 117 slots Ladder (8mm pitch)
(1) Boat Rotation: installed
(1) Pedestal Materiel/Type: Quartz Sand blast OD300 H350 1fins
(1) Auto Shutter: installed
Power Distribution:
Voltage, 3 Phase: 208VAC
Voltage, Single Phase: 120VAC
Frequency: 60Hz
User Interface:
(2) Operation Panel: Front/rear Gas Box and Operation Panel Installed
(2) Indicator Type: Superset
Operation software type: Linux
(4) Gas Leak Detector Material/Type: Riken TEOS/CLF3
Dry pumps: not included.
TEL / TOKYO ELECTRON Alpha 303i is a leading diffusion furnace & accessories for advanced semiconductor processes. TEL ALPHA-303I is a versatile, high-speed, high-quality diffusion furnace that offers reliable performance, adjustable temperature control and a wide range of functions for maximum process repeatability. TOKYO ELECTRON ALPHA-303 I is a single-chamber furnace with a quartz sidewall and a hot zone capacity of 455L. This diffusion furnace has a low thermal mass radiant heating equipment that is capable of rapid temperature changes. TEL / TOKYO ELECTRON ALPHA 303 I is also equipped with a three-zone baking system for optimum control of temperature uniformity within the process chamber. Alpha 303i also includes a vertical-lift sample loading unit that enables automatic transfer of the wafer boats to the process chamber. The wafer boat can be automatically elevated to two different temperatures in order to optimize the cooling process. Additionally, the temperature of the process chamber can be pre-set according to the needs of the process. TEL / TOKYO ELECTRON ALPHA-303 I machine is equipped with a comprehensive range of accessories, including a closed-loop cooling tool. This asset helps maintain the desired temperature in the process chamber by utilizing sensors to measure and control the temperature of the process gas. TOKYO ELECTRON Alpha 303i also features a range of process-control measures such as an integrated Auto recipe generator for fast, reliable recipes and advanced parameter set-up. It is also capable of process monitoring for a variety of process parameters, including temperature, flow rate, pressure, and total gas flow. ALPHA 303 I is designed to enable an extremely fast and precise thermal cycle, with a short recovery time between runs. With its high-precision temperature control, TOKYO ELECTRON ALPHA-303I model offers excellent repeatability and reproducibility. TEL Alpha 303i also features a range of safety features, including a water-cooled vacuum pump that is capable of quickly evacuating any process gas or air from the process chamber. This ensures maximum safety during operation. TEL ALPHA-303 I equipment also features a backup gas supply system to ensure the process chamber is always adequately supplied with the proper process gas. ALPHA-303 I is a reliable and versatile diffusion furnace & accessories that offers excellent performance and repeatability for advanced semiconductor processes. Its range of safety features coupled with its advanced temperature control measures make it a powerful and safe solution for a wide variety of process needs.
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