Used TEL / TOKYO ELECTRON Alpha 303i #9167199 for sale

TEL / TOKYO ELECTRON Alpha 303i
ID: 9167199
Wafer Size: 12"
Vintage: 2005
Vertical LPCVD furnaces, 12" Currently warehoused 2005 vintage.
TEL / TOKYO ELECTRON Alpha 303i is a diffusion furnace that is widely used in industrial and research applications of thin film deposition. TEL ALPHA-303I consists of a 6" diameter quartz reactor chamber, an integrated gas injection equipment, a quartz susceptor and a temperature controller. The temperature controller features a top-of-the-line PID algorithm which provides a stable and accurate substrate temperature up to 1100°C. The whole system operates through a touchpad controller which has an intuitive user interface. TOKYO ELECTRON ALPHA-303 I diffusion furnace is a vertical quartz chamber with a wall around the quartz crucible. The chamber has a gas injection unit that enables the injection of nitrogen, hydrogen, argon, or other gas into the chamber. The gas is also used to create a protective shielding around the crucible, protecting it from contamination. The thermal control machine consists of two thermocouple inputs that monitor the temperature of the quartz crucible and the chamber temperature respectively. Downstream from the diffusion furnace is an array of accessories including a vacuum tool, a mechanical door, a high temperature bellows, a cold trap, a pressure gauge and a gas purge fitting. Other optional components include a multiple port injector, a multiple zone injector, a furnace manifold, a valve house and more. Alpha 303i diffusion furnace offers superior temperature uniformity and repeatability, as well as excellent thermal stability. This ensures a high-quality thin film deposition process. It is also cost-effective, as low-cost components last longer and can be more easily replaced than with other models. In summary, ALPHA 303 I diffusion furnace and accessories offer superior temperature control and uniformity, excellent thermal stability, and cost-effectiveness. It is suitable for industrial and research application in thin film deposition, making it a valuable and invaluable tool for manufacturing professionals.
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