Used TEL / TOKYO ELECTRON Alpha 303i #9186622 for sale

ID: 9186622
Wafer Size: 12"
Vintage: 2006
Vertical diffusion furnace, 12" Process: TOZS Anneal (Tones SilaZene) Main top cover WVG I/O Unit I/O Top cover Loadport Back door Exhaust box Operation panel Gas box Power box RCU RCU 1 RCU 2 Heater chamber RCU Duct (3) Parts boxes NDU Lot capability: 50 Process speed per unit time: Wafer CHG, loading: 40 Process: 2H Wafer DIS-CHG, un-loading: 40 Clock bandwidth: 60 Hz Frequency: 60 Hz Power: 208 V, 200 A, 3 Phase (Heater) 200 V, 40 A, 1 Phase (Controller) 2006 vintage.
TEL / TOKYO ELECTRON Alpha 303i is a state-of-the-art diffusion furnace and accessory equipment designed for high-performance semiconductor manufacturing. This advanced tool incorporates cutting-edge technology and features to provide precise control over the diffusion process, enabling the production of high-quality semiconductor devices with exceptional performance characteristics. At the core of TEL ALPHA-303I system is the diffusion furnace, which is a critical component in the fabrication of semiconductor devices. The furnace is equipped with multiple heating zones, each with independent temperature control capabilities, allowing for precise temperature profiling during the diffusion process. This level of control is essential for achieving uniform diffusion profiles and minimizing process variations across the wafer surface. TOKYO ELECTRON ALPHA-303 I unit is designed to accommodate a wide range of process gases and dopants, enabling customization of the diffusion process to meet the specific requirements of different semiconductor device applications. The machine features advanced gas delivery systems and mass flow controllers to ensure accurate and reproducible gas flow rates, essential for achieving consistent doping levels and device performance. In addition to the diffusion furnace, TEL / TOKYO ELECTRON ALPHA-303I tool includes a range of accessories and peripherals to support efficient and reliable semiconductor manufacturing processes. These accessories may include load locks for wafer loading and unloading, wafer handling robots for automated wafer transfer, and process monitoring and control systems for real-time process optimization. One of the key features of TEL / TOKYO ELECTRON ALPHA 303 I asset is its advanced process control capabilities. The model is equipped with sophisticated control algorithms and software that enable real-time monitoring of key process parameters such as temperature, gas flow rates, and pressure. This allows operators to quickly identify and correct any deviations from the desired process conditions, ensuring consistent and repeatable device performance. TEL ALPHA-303 I equipment is also designed for ease of use and maintenance, with a user-friendly interface that provides operators with intuitive control over the system parameters. The unit is equipped with diagnostic tools and self-calibration routines to ensure optimal machine performance and minimize downtime due to maintenance or calibration activities. Overall, ALPHA-303 I is a versatile and high-performance diffusion furnace and accessory tool that meets the stringent requirements of modern semiconductor manufacturing. With its advanced technology, precise process control, and reliable performance, ALPHA-303I is an essential tool for producing high-quality semiconductor devices with exceptional performance characteristics.
There are no reviews yet