Used TEL / TOKYO ELECTRON Alpha 303i #9211140 for sale

TEL / TOKYO ELECTRON Alpha 303i
ID: 9211140
Systems.
TEL / TOKYO ELECTRON Alpha 303i is an advanced diffusion furnace and accessory specifically designed for semiconductor device production. Its advanced heating technology ensures reliable thermal diffusion processes for advanced device structures. TEL ALPHA-303I features a new type of large area furnace chamber known as the 3cm furnace chamber. This chamber has a three-dimensional design that is optimized for uniform heat distribution, improving matching of the chamber temperature and the substrate. It also effectively captures reactant gases and prevents contamination of the device structure. The chamber is also compatible with automated manual transfer and also features a novel vacuum gate valve and bellow coupling for optimized nitrogen or argon processing. TOKYO ELECTRON ALPHA-303 I also features a dual-temperature measurement equipment for reliable thermal diffusion. Using a thermal couple measurement head, this system accurately detects the temperature of both sides of the substrate and allows for reliable control of the process conditions. TEL / TOKYO ELECTRON ALPHA-303 I also features an automated delivery unit that allows for precise and repeatable processes. The machine features a multi-channel digital flow controller and a variety of ports for easy installation and removal of modules. The automated delivery tool also allows for precise and repeatable processes, coupled with automated control software for efficient process management. Overall, TEL / TOKYO ELECTRON ALPHA-303I is an advanced diffusion furnace and accessory specifically designed for advanced semiconductor device production. Its advanced heating technology ensures reliable thermal diffusion processes for advanced device structures, while its dual-temperature measurement asset and automated delivery model offer precise and repeatable processes. Furthermore, its 3cm furnace chamber improves matching of the chamber temperature and substrate, and captures reactant gases to prevent contamination.
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