Used TEL / TOKYO ELECTRON Alpha 303i #9213304 for sale
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ID: 9213304
Wafer Size: 12"
Vintage: 2006
Vertical diffusion furnace, 12"
Process: MTO
Power box
I/O
Heater chamber
Exhaust box
Main top cover
I/O Top cover
Back door
Loadport
Operation panel
(3) Parts boxes
Lot capability: 50
Process speed per unit time:
Wafer CHG, loading: 40
Process: 2H
Wafer DIS-CHG, un-loading: 40
Clock bandwidth: 60 Hz
Frequency: 60 Hz
Power supply:
208 V, 200 A, 3 Phase (Heater)
200 V, 40 A, Single phase (Controller)
2006 vintage.
TEL / TOKYO ELECTRON Alpha 303i is a state-of-the-art diffusion furnace equipment designed for semiconductor manufacturing processes. This tool plays a critical role in the production of advanced semiconductor devices by facilitating the diffusion of dopant materials into silicon wafers to modify their electrical properties. TEL ALPHA-303I is equipped with advanced features and capabilities that enable precise control over the diffusion process, leading to high-quality and high-performance semiconductor devices. One of the key features of TOKYO ELECTRON ALPHA-303 I is its high-temperature capabilities, allowing it to achieve the temperatures required for diffusion processes with exceptional accuracy and stability. The system is capable of reaching temperatures up to X degrees Celsius, ensuring efficient and uniform diffusion of dopant materials across the entire wafer surface. This precise temperature control is essential for achieving the desired electrical characteristics of the semiconductor devices being manufactured. In addition to its temperature control capabilities, Alpha 303i is equipped with a sophisticated gas delivery unit that enables the precise introduction of dopant gases into the process chamber. This gas delivery machine allows for precise control over the concentration and flow of dopant gases, ensuring uniform and consistent doping of the silicon wafers. The tool is also equipped with advanced monitoring and control systems that allow operators to monitor and adjust the gas flow parameters in real-time, ensuring optimal diffusion results. ALPHA-303 I features a horizontal wafer configuration, which allows for the processing of multiple wafers simultaneously, increasing throughput and efficiency in semiconductor manufacturing. The asset is also designed to accommodate wafers of various sizes, making it versatile and adaptable to different production requirements. The horizontal configuration of the model ensures uniform distribution of heat and dopant gases across all wafers, resulting in consistent and reliable diffusion results. Furthermore, ALPHA 303 I is equipped with a range of safety features to ensure the protection of operators and the integrity of the manufacturing process. The equipment is designed with comprehensive safety interlocks and alarms to prevent accidents and ensure compliance with industry safety standards. Additionally, TEL / TOKYO ELECTRON ALPHA-303 I features built-in diagnostics and monitoring systems that allow for the early detection of any issues or abnormalities, reducing downtime and minimizing the risk of wafer damage. Overall, TEL ALPHA 303 I diffusion furnace system is a highly advanced and reliable tool for semiconductor manufacturing processes. With its precise temperature control, advanced gas delivery unit, horizontal wafer configuration, and comprehensive safety features, ALPHA-303I offers semiconductor manufacturers the capabilities and control they need to produce high-quality and high-performance devices efficiently and effectively.
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