Used TEL / TOKYO ELECTRON Alpha 303i #9251686 for sale

TEL / TOKYO ELECTRON Alpha 303i is a state-of-the-art diffusion furnace and accessories designed to provide high-end films at the highest level of purity, uniformity, and repeatability. It features advanced technology that enables rapid processing of a wide range of materials. TEL ALPHA-303I is a multi-stage furnace with a three-zone heating equipment, allowing it to provide deep reactive ion etching (DRIE) and thermal oxidation processes with superior quality and repeatability. TOKYO ELECTRON ALPHA-303 I utilizes a unique plasma-generation chamber, which is fed with oxygen, nitrogen, or silicon hydrogen gas in order to modify various process conditions for improved uniformity and purity. It features active temperature and pressure staining uniformity control systems with temperature programming and temperature mapping capabilities. ALPHA-303I also is a capable of a variety of gas delivery techniques, from time-varying flow to precisely-timed gas pulses. This feature allows users to achieve precise film deposition and process control. TEL / TOKYO ELECTRON ALPHA-303I is provided with an integrated multi-point monitoring system, allowing users to collect data on numerous process parameters like pressure, temperature, gas flow and oxygen concentration in the chamber. This data is used to create uniformity maps or to optimize TOOLs. TOKYO ELECTRON ALPHA 303 I is a multi-tank gas delivery unit - the user can also choose a low-pressure or high-pressure configuration to establish a conducive atmosphere for various processes. An electron capture machine is also included, along with a quartz-clad RF inductor and accompanying RF power supply for controlling the frequency. This allows users to perform electrostatic coating, sputtering, and PVD treatments. TEL / TOKYO ELECTRON ALPHA 303 I also includes a lift-off process, as well as an advanced baking mode with door auto-opening and roof in-out motion. The lift-off process can be used for wafer bias etching, plasma enhanced chemical vapour deposition (PECVD), and other surface treatments for enhanced film quality. The oven cover can also be loaded up to 20kg, allowing users to achieve uniformity and prevent distortion issues. In addition, TEL ALPHA 303 I includes a chemical end-point detection tool for dry cleaning and is equipped with a 400mm uniformity mapping asset. This allows users to ensure stable process control and to obtain precise batch process data. Moreover, Alpha 303i is coated with a special low-resistance ceramic finish, providing the utmost precision, uniformity, and repeatability. TEL ALPHA-303 I is an advanced piece of equipment that provides users with a wide range of features to ensure superior perfection, quality, and repeatability. It allows users to perform a wide variety of processes at the highest quality, while also providing data to ensure successful process control.