Used TEL / TOKYO ELECTRON Alpha 303i #9311031 for sale

TEL / TOKYO ELECTRON Alpha 303i is a powerful, high-performance diffusion furnace and associated accessories. It is designed for high-yield manufacturing of semiconductor devices through integrated processes such as annealing, CVD, and oxidation. This equipment is ideal for a range of semiconductor device applications such as interconnects, shallow trench isolation, MOSFET, and emerging device fabrication. TEL ALPHA-303I features a three-zone configuration for high performance, ease of operation, and scalability to match customer needs. Its top and bottom quartz furnace tubes are each divided into two separate, independently operated zones. The system is also equipped with an inductive heating bottom zone which promotes uniform temperature control in order to achieve optimal process and yield results. Additionally, TOKYO ELECTRON ALPHA-303 I comes with a variety of control systems to ensure safety and accuracy. It features a Passivated Emitter Contact (PEC) controller for integrated chamber pressure control. This minimizes backside adhesion of the heated films. The advanced design of TEL ALPHA 303 I also promotes repeatable processes and offers optimised repeatability of processes in a stable environment. In addition to this, the furnace is equipped with an auto-purge unit which offers fast gas exchange and reduces the chemical reaction of residual gases with heated films. There is also a gas analyzing unit which is used to easily monitor the gases present inside the furnace, thereby helping to ensure optimal process conditions. Furthermore, an optional exhaust gas processing unit can be attached to the top zone. Finally, TOKYO ELECTRON ALPHA 303 I has a wide temperature range capability, providing temperatures up to 1150°C. It also offers innovations such as pressure safety valves, dust collectors for the top tube, and cooled work holders for the bottom tube. This makes it suitable for a variety of applications where precise control of process parameters, high throughput, and advanced yield are essential. To sum up, TEL / TOKYO ELECTRON ALPHA-303I diffusion furnace is a highly efficient machine that facilitates high-yield device fabrication. It features a three-zone configuration, a wide temperature range, and a variety of control systems which ensure safety and accuracy. These features make ALPHA-303 I the ideal choice for a variety of semiconductor device applications.