Used TEL / TOKYO ELECTRON Alpha 303i #9357815 for sale

TEL / TOKYO ELECTRON Alpha 303i
ID: 9357815
Wafer Size: 12"
LP P-Doped poly furnace, 12" Process: D-Poly-small flow Boat operation: (2) Boats ASYST / ATR9100 Furnace unit: Heater type: VMM-56-002 5 zones / 500°C -1000°C T/C For over temperature protection: Kit, chamber O.H.SNSR Temperature controller: MA901-8FK09-Z250A Wafer / Carrier handing: Wafer type: Semi standard notch, 12" Carrier type: FOUP / 25-Slots (16) Carrier storages Fork type / material: 1+4 / Al203 W/T Wafer I/F speed (U/D) Wafer loading / Unloading sequence: ED => P => M / M => P => ED Boat / Pedestal: Production wafers: (100) Wafers Boat material: SiC with CVD-coat Boat type: (117) Slots ladder, 8mm Boat rotation Pedestal type: Quartz Process tube: Quartz outer and inner tube Inner type: Straight Internal T/C type Outer tube interior wall type Tube sealing: O-Ring seal Fab constraint: Waves system controller Front operation panel Front MMI and gas flow chart: MMI and GFC General pressure display unit: Pressure-Mpa / Vac-Torr Gas cabinet exhaust display unit: SI (Pa) Furnace temperature controller: M560A Vacuum system: Main valve: CKD VEC Vacuum exhaust system Vacuum pressure controller: CKD VEC Vacuum gage: Pressure control: MKS Capacitance manometer Press monitor: MKS Capacitance manometer (133 kPa) Pump monitor: MKS Capacitance manometer Gas distribution system: Basic style: Integrated gas system Tubing: Stainless steel / Electrical-polish (STD) FUIJKIN Manual valve FUIJKIN Air-operated valve MYKROLIS Filter VERIFLO Regulator Soft backfill injector MFC: SiH4: 3 SLM PH3: 500 SCCM PH3: 50 SCCM PH3: 30 SCCM ClF3: 5 SLM N2: 3 SLM (4) N2: 5 SLM Process pressure: 73 Pa, 133 Pa Process temperature: 510°C, 525°C, 530°C.
TEL / TOKYO ELECTRON Alpha 303i is a high-performance diffusion furnace equipment designed for use in IC-related production. It is equipped with an advanced heating system that allows for faster and more consistent results. The furnace is constructed from hard and thick stainless steel to ensure long-term reliability and accuracy. It includes an automated sample transfer unit which is capable of placing samples into the furnace at an extremely high rate. In terms of performance, TEL ALPHA-303I is capable of performing rapid heat-up times of up to 900°C in a matter of minutes. It is equipped with an innovative temperature control machine that ensures an extremely uniform temperature throughout the heat-up process. Even when working with very large substrates, the tool can maintain a consistent temperature without any discrepancies. Additionally, TOKYO ELECTRON ALPHA-303 I is equipped with an advanced electronic power control asset which reduces power consumption and provides high-quality temperature control. TEL / TOKYO ELECTRON ALPHA-303 I includes a variety of additional features to improve its performance. It has an integrated chemical vapor deposition (CVD) module that enables tailored doping of electrical substrates, making it an ideal choice for IC related production. Alongside this, it also includes a variety of accessories such as a quartz boat, ceramic covers, and bell jars. These add-ons further enhance the performance of the device by enabling improved heat up distribution. Overall, TEL ALPHA-303 I is a high-performance diffusion furnace model designed for IC related production. It is constructed from stainless steel to ensure longevity and accuracy. It is also equipped with a variety of features including an automated sample transfer equipment, rapid heat-up times, temperature control system, and CVD module. Additionally, it includes a variety of accessories that can further enhance its performance.
There are no reviews yet