Used TEL / TOKYO ELECTRON Alpha 303i #9357815 for sale
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ID: 9357815
Wafer Size: 12"
LP P-Doped poly furnace, 12"
Process: D-Poly-small flow
Boat operation: (2) Boats
ASYST / ATR9100
Furnace unit:
Heater type: VMM-56-002 5 zones / 500°C -1000°C
T/C For over temperature protection: Kit, chamber O.H.SNSR
Temperature controller: MA901-8FK09-Z250A
Wafer / Carrier handing:
Wafer type: Semi standard notch, 12"
Carrier type: FOUP / 25-Slots
(16) Carrier storages
Fork type / material: 1+4 / Al203
W/T Wafer I/F speed (U/D)
Wafer loading / Unloading sequence: ED => P => M / M => P => ED
Boat / Pedestal:
Production wafers: (100) Wafers
Boat material: SiC with CVD-coat
Boat type: (117) Slots ladder, 8mm
Boat rotation
Pedestal type: Quartz
Process tube:
Quartz outer and inner tube
Inner type: Straight
Internal T/C type
Outer tube interior wall type
Tube sealing: O-Ring seal
Fab constraint:
Waves system controller
Front operation panel
Front MMI and gas flow chart: MMI and GFC
General pressure display unit: Pressure-Mpa / Vac-Torr
Gas cabinet exhaust display unit: SI (Pa)
Furnace temperature controller: M560A
Vacuum system:
Main valve: CKD VEC
Vacuum exhaust system
Vacuum pressure controller: CKD VEC
Vacuum gage:
Pressure control: MKS Capacitance manometer
Press monitor: MKS Capacitance manometer (133 kPa)
Pump monitor: MKS Capacitance manometer
Gas distribution system:
Basic style: Integrated gas system
Tubing: Stainless steel / Electrical-polish (STD)
FUIJKIN Manual valve
FUIJKIN Air-operated valve
MYKROLIS Filter
VERIFLO Regulator
Soft backfill injector
MFC:
SiH4: 3 SLM
PH3: 500 SCCM
PH3: 50 SCCM
PH3: 30 SCCM
ClF3: 5 SLM
N2: 3 SLM
(4) N2: 5 SLM
Process pressure: 73 Pa, 133 Pa
Process temperature: 510°C, 525°C, 530°C.
TEL / TOKYO ELECTRON Alpha 303i is a high-performance diffusion furnace equipment designed for use in IC-related production. It is equipped with an advanced heating system that allows for faster and more consistent results. The furnace is constructed from hard and thick stainless steel to ensure long-term reliability and accuracy. It includes an automated sample transfer unit which is capable of placing samples into the furnace at an extremely high rate. In terms of performance, TEL ALPHA-303I is capable of performing rapid heat-up times of up to 900°C in a matter of minutes. It is equipped with an innovative temperature control machine that ensures an extremely uniform temperature throughout the heat-up process. Even when working with very large substrates, the tool can maintain a consistent temperature without any discrepancies. Additionally, TOKYO ELECTRON ALPHA-303 I is equipped with an advanced electronic power control asset which reduces power consumption and provides high-quality temperature control. TEL / TOKYO ELECTRON ALPHA-303 I includes a variety of additional features to improve its performance. It has an integrated chemical vapor deposition (CVD) module that enables tailored doping of electrical substrates, making it an ideal choice for IC related production. Alongside this, it also includes a variety of accessories such as a quartz boat, ceramic covers, and bell jars. These add-ons further enhance the performance of the device by enabling improved heat up distribution. Overall, TEL ALPHA-303 I is a high-performance diffusion furnace model designed for IC related production. It is constructed from stainless steel to ensure longevity and accuracy. It is also equipped with a variety of features including an automated sample transfer equipment, rapid heat-up times, temperature control system, and CVD module. Additionally, it includes a variety of accessories that can further enhance its performance.
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