Used TEL / TOKYO ELECTRON Alpha 303i #9379788 for sale

TEL / TOKYO ELECTRON Alpha 303i is a dual-chamber, high-temperature, thermal vacuum diffusion furnace used in semiconductor processing. It is designed to provide precise thermal control of processing conditions to ensure uniformity of thin films and other molecular interactions. TEL ALPHA-303I features two independent source/drain chambers that can be operated at different temperatures. Each chamber contains an independent heating system with high-temperature insulation and precision temperature control. The distribution range of the furnace is 40-1000°C with a uniformity of ±5°C. The heated zone is accessed with ceramic tubes and is equipped with a range of accessories for more accurate controls. TOKYO ELECTRON ALPHA-303 I also features an active load lock with a protective flapper valve to keep nitrogen and other gases within the processing chamber. The vacuum system is capable of reaching base pressure less than 133 mTorr in both chambers. Additionally, the furnace is equipped with a gas flow controller and vacuum/pressure gauge to allow for precise monitoring of process parameters. The loading and processing stages of thin film deposition can be automatically sequenced using GEMs In-Situ process control software. This software also provides data logging and comprehensive set of commands for process control. The furnace is indexed with an RS-232 digital interface to allow for remote control via a personal computer. TEL / TOKYO ELECTRON ALPHA-303I also includes a variety of accessories, such as wafer lifters, wafer transfer boxes, boat lifts, and sample holders. These accessories allow for efficient loading and unloading of materials. The furnace also includes an integrated helium leak detector and a graphite heat shield housing that reduce heat transfer and energy consumption. Finally, TEL Alpha 303i is engineered to meet all relevant safety standards and features a variety of visual and audible indicators to alert the operator of any process errors. The furnace also features an air curtain to protect the operator during operation. This advanced diffusion furnace is ideally suited for R&D and production of semiconductors and other components requiring precision temperature processing. With its combination of robust construction, precision temperature control, adjustable heat zones, and comprehensive process control software, TOKYO ELECTRON ALPHA-303I offers an unparalleled level of performance.