Used TEL / TOKYO ELECTRON Alpha 303i #9383406 for sale

TEL / TOKYO ELECTRON Alpha 303i
ID: 9383406
Furnace.
TEL / TOKYO ELECTRON Alpha 303i is a highly advanced semiconductor manufacturing tool, involving a diffusion furnace and accessorie. This tool offers the latest high-end technology to produce semiconductors with advanced performance. TEL ALPHA-303I tool features advanced furnaces and accessorie that makes it a reliable tool in advanced semiconducting production processes. TOKYO ELECTRON ALPHA-303 I diffusion furnace is designed to provide precise metrology and control of the temperature and flux of both uniformity and non-uniformity parts. The furnace is built with powerful radiation monitoring and high-grade controlled thermal annealing for superior process control. The high purity quartz in-situ furnaces offers advanced wafer uniformity, as well as precise control of diffusion parameters in an integrated package. The diffusion temperature is accurately monitored and maintained with a variety of monitoring systems. ALPHA-303I also features the Universal Clamp System (UCS) with precise closed loop wafer control for enhanced wafer placement accuracy. The UCS can store the wafer sizes and automatically calibrates the parameters for each size. The UCS also assists in the optimization and standardization of wafer placement across multiple substrates. This tool is also built with important safety features in order to allow a safe operation when handling and loading the substrates. TEL / TOKYO ELECTRON ALPHA-303 I also comes with a variety of accessory items that are necessary for the diffusion process, such as a pyrometer, nitrogen unit, scrubber, heater/preheater, susceptor, and thermal exhaust. The pyrometer is used to monitor and maintain the diffusion parameters, while the nitrogen unit is used to cool down the substrate during the diffusion process. The scrubber is used to clean the film surface and limit contact contamination. The susceptor is used to contain the film from oxidation and decomposition. The thermal exhaust is used to vent any gases created during the diffusion process to the proper collection area. TEL ALPHA 303 I is highly advanced process manufacturing tool that offers a variety of features and accessories essential in production of semiconductors. With the ability to tolerate both uniformity and non-uniformity parts, ALPHA-303 I provides precise control of diffusion parameters that are necessary to achieve superior process control. The latest high-end technology incorporated into TEL / TOKYO ELECTRON ALPHA 303 I assures that the device offers superior performance in a reliable tool platform.
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