Used TEL / TOKYO ELECTRON Alpha 303i #9412408 for sale

TEL / TOKYO ELECTRON Alpha 303i
ID: 9412408
Wafer Size: 12"
Furnaces, 12" 2005-2008 vintage.
TEL / TOKYO ELECTRON Alpha 303i is a diffusion furnace and accessories unit used for film deposition, batch process, and single-wafer process. This unit is ideal for creating thin films on various substrates such as silicon, oxide, and nitride. It is efficient, cost effective, and capable of producing high quality films. TEL ALPHA-303I is composed of three essential components: the diffusion furnace, the wafer cassette, and the load lock chamber. The diffusion furnace is a sealed chamber filled with a high temperature gas, such as an inert gas, ammonia, and hydrogen, to reach extremely high temperatures. This is used both to vaporize the material and to deposit it onto the substrate. The wafer cassette holds up to fifty four pieces of two inch substrates and is responsible for supplying the material to the furnace. The load lock chamber is used to rapidly transfer substrates into the lattice without contamination. TOKYO ELECTRON ALPHA-303 I is configured with many advanced features, including a multi-zone temperature controller, a substrate heating equipment, a quartz showerhead, and a powerful ceramic infrared convection heaters. The multi-zone temperature controller allows for temperature precision and control across the chamber, while the heating system regulates the temperature of the substrates. The quartz showerhead provides an even distribution of gas over the substrate and helps improve the uniformity of the deposited film. The ceramic infrared convection heaters ensure accurate and consistent heating of the substrate and give users complete control over the thickness and composition of the film. This unit also is equipped with a safety unit that is designed to protect operators from dangerous situations. It has a built in security machine to prevent unauthorized access and a pressure control tool that monitors the pressure inside the diffusion chamber. Additionally, Alpha 303i has a monitoring asset which measures the temperature, pressure and other parameters inside the diffusion furnace, as well as reflecting medical gases and exhaust systems that facilitates the safe and efficient operation of the unit. ALPHA 303 I is a powerful, reliable, and maintainable diffusion furnace and accessories unit. It provides precision temperature control and an automated process for producing high quality films for a wide range of substrates. With its variety of advanced features, it is an ideal choice for research and commercial applications.
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