Used TEL / TOKYO ELECTRON Alpha 8 #9071279 for sale

TEL / TOKYO ELECTRON Alpha 8 is a diffusion furnace & accessory, made to bring the most efficient and economical performance for thin-film deposition operations. TEL Alpha 8 features a full range of advanced process capabilities and a revolutionary control architecture that makes the setup, adjustment, and monitoring of the furnace easier and more efficient than ever before. The ergonomically designed and intuitive software allows operators to quickly and accurately adjust parameters, programs, and access data. The proprietary low-emission design delivers a clean, efficient furnace that produces a consistent high-quality product. TOKYO ELECTRON ALPHA-8 features a spacious chamber designed to accommodate up to four 2" diameter wafers and large substrates. The spacious design allows for plenty of room to adjust doughnut sources and other elements located within the chamber. The high-temperature capability of TEL / TOKYO ELECTRON ALPHA-8 reaches up to a maximum of 1275°C for rapid thermal process (RTP) applications, and up to550°C in static applications. Dual-wall construction provides excellent insulation between the walls, preventing heat loss and maximizing temperature uniformity. The heated chamber is equipped with a vapor source for introducing reactants into the system, in addition to a patented three-way shut-off valve that ensures that the chamber can be isolated and purged at any time. Temperature uniformity of ALPHA-8 is maintained through an advanced exhaust system that can be adjusted for a variety of deposition techniques. The built-in data logging system allows operators to review past data to investigate troublesome parameters or make process adjustments. Parameters, programs, and settings can be saved into a memory card, allowing users to quickly and easily transfer program information to multiple TOKYO ELECTRON Alpha 8 units. Utilizing an onboard resistivity meter provides feedback on filmresistance, allowing users to track changes in process conditions and adjust settings on the fly if needed. To ensure optimal productivity, TEL ALPHA-8 is equipped with a multiple-zone controller to control multiple zones with one controller. Alpha 8 provides users with a number of optional additional features such as a rotary wafer susceptor for angle deposition, a quartz-viewer window to observe film deposition, and an ion source for RTP applications. All of these features provide advanced capabilities to fit a wide range of needs and processes. TEL / TOKYO ELECTRON Alpha 8 provides users with an advanced and reliable diffusion furnace and accessory to meet all of their deposition needs. TEL Alpha 8 is an economical and safe choice with intuitive features, advanced control architecture, multiple-zone control, and excellent temperature uniformity.