Used TEL / TOKYO ELECTRON Alpha 801 #199968 for sale

TEL / TOKYO ELECTRON Alpha 801
ID: 199968
Wafer Size: 8"
Vertical furnaces, 8".
TEL / TOKYO ELECTRON Alpha 801 is a diffusion furnace and accessorie for silicon doping. It is designed for the production of semiconductor devices, such as microprocessors and solar cells. TEL Alpha 801 utilizes advanced technology and equipment to provide precise and repeatable silicon doping, so that the processed devices perform to exacting standards. TOKYO ELECTRON Alpha 801 features a quartz graphite chamber, an exhaust equipment, and a gas control system. The quartz graphite chamber is included for the introduction of up to four process gases. It features a maximum operating temperature of 1100°C, allowing high temperature reactions, and is designed for rapid heating and cooling. The exhaust unit is included for purging used gases from the reaction chamber. It also features a powerful fan for efficient removal of the used gases. The gas control machine includes a series of control valves for preparing and throttling process gas flow. Alpha 801 also comes with an integrated control panel, allowing for precise adjustment and monitoring of process parameters. With its easy-to-use interface, operators can adjust and monitor parameters such as chamber temperature, gas flow rate, and pressure. The also control panel includes a variety of safety features, designed to ensure safe operation. The machine also features a range of other accessories. These include a transport tool, allowing the device to be quickly and safely loaded and unloaded; a loading/unloading tray, for safely transferring samples between the furnace and process chamber; a sample chuck, for securely holding samples during processing; and a nitrogen purge asset, for maintaining a nitrogen atmosphere around the furnace as needed. TEL / TOKYO ELECTRON Alpha 801 is a sophisticated tool for silicon doping and other processes. With its performance and versatility, it can meet the needs of a range of semiconductor applications. It is easy to use, with precise control over parameters, and is a reliable solution for device production.
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