Used TEL / TOKYO ELECTRON Alpha 801D #149843 for sale

TEL / TOKYO ELECTRON Alpha 801D
ID: 149843
Anneal furnace.
TEL / TOKYO ELECTRON Alpha 801D is a diffusion furnace and accessories. It is used in a wide range of industries, including semiconductor manufacturing and research, to deposit optical, electrical, and thermal layers on various substrates. It is specifically designed to process multiple types of materials simultaneously, aiding in the production of complex devices. TEL Alpha 801D is a vertical diffusion furnace that comes with a loadlock and sidewall members, making it a truly all-in-one package. Its quartz Quartz Process Tube (QPT) is designed for high temperatures, allowing for the diffusion of both non-metallic and metallic materials with excellent homogeneity. The process chamber is further equipped with a six-zone cavity-based heating equipment, which provides uniform temperatures, even during high-volume product runs. Additionally, the use of sample changing capability and flow control systems allows for good thermal uniformity throughout the processing cycle. The furnace is built with temperature sensors and a controller, which provide real-time data to the user regarding the temperature conditions of the process chamber. This data can be displayed on the controller's LCD screen or through the included SCADA software. The furnace also comes with an integrated gas delivery system that enables the introduction of reactant gases in an automated fashion, and with an optional Safety Controller unit, which ensures safe operation. TOKYO ELECTRON Alpha 801D can accommodate multiple types of substrates, from 2" to 8" squares, which can be handled with an optional substrates handling machine. It also comes with an asphalt sealant for better sealing, allowing for the diffusion of higher temperatures without risking leakage or microcracking. Alpha 801D is a powerful and versatile tool that not only enables the accurate production of diffusion layers, but also performs thermal treatments with high accuracy. Its uniform temperature distribution, high-temperature operations, reliable sample-changing tool and integrated gas delivery asset, ensure a reliable and accurate deposition of metal layers on various substrates.
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