Used TEL / TOKYO ELECTRON Alpha 803D #9287449 for sale

TEL / TOKYO ELECTRON Alpha 803D is a state-of-the-art diffusion furnace and accessories designed for modern semiconductor device fabrication and process development. This product line is part of TEL range of diffusion furnaces and offers unparalleled control and performance. TEL Alpha 803D is a versatile tool for production and development use, featuring a smart thermocouple input controller for temperature profiling and a powerful digital signal processor which accommodates process flexibility. The furnace is equipped with a powerful PC-based real-time hardware and software equipment for closed-loop digital heated-zone control and zone measurement. TOKYO ELECTRON Alpha 803D utilizes two high-performance resistance-heated process chambers - an inner crucible and an outer zone - which feature uniform temperatures with excellent stability. The outer zone is driven by a variable frequency motor, and includes ID and OD, PID/PIV and temporal control. The thermocouple input controller provides temperature profiling with 5 curves, including auto-tuning, curve manipulation and real-time feedback. Alpha 803D is designed to ensure reliable and reproducible results in applications such as diffusion, oxidation, nitridation, alloying, annealing, and other semiconductor processing. With a process temperature range of up to 1000°C, control accuracy of ±2°C and a uniformity of ±3°C, this system delivers consistent and high-quality wafer results. It also features an automated process schedule for easy operation, and provides detailed feedback and analysis of the entire process. Other features of TEL / TOKYO ELECTRON Alpha 803D include a multi-gas delivery unit, optional air/gas monitor and leak detection machine for safety, a high-temperature CCD camera monitor, and a choice of susceptors. The superior performance of this tool is further enhanced with its high-grade insulation, leakage protection and chamber sealing technology. In summary, TEL Alpha 803D is an advanced diffusion furnace that offers superior accuracy, reliability and reproducibility to semiconductor device fabrication. Its multi-gas delivery asset, automated process schedule, and temperature profiling and control capabilities make it an invaluable tool for development and production applications.