Used TEL / TOKYO ELECTRON Alpha 803SD #293651970 for sale

TEL / TOKYO ELECTRON Alpha 803SD
ID: 293651970
Diffusion furnace.
TEL / TOKYO ELECTRON Alpha 803SD is a high-performance diffusion furnace and its associated accessories. This system provides accurate and reliable processing for a wide range of semiconductor and optoelectronic materials. It is used in many applications such as CVD and PVD processes, crystal deposition, or wafer fabrication. TEL Alpha 803SD comprises a variety of components, each of which is designed to help ensure that process parameters remain optimal. Its diffusion hot-wall type furnace chamber is constructed using 21-4N stainless steel, and its dimensions provide a generous internal volume which allows for plenty of substrate area. In addition, the ceiling and walls of the chamber have an extensive heating area, enabling uniform temperature profiles on different substrates. All operations are controlled by an easy-to-use, user-friendly graphical user interface (GUI). TOKYO ELECTRON Alpha 803SD's precision temperature range of up to 1,000°C can be adjusted to suit various applications. Its advanced uniformity control technology, meanwhile, is designed to reduce variation between temperature zones and prevent hotspots. In addition, a variety of recipes can be stored for automatic execution of processes, ensuring consistent delivery of desired results. Alpha 803SD also features multiple safety features, including independent heating zones and gas valve interlocks. It is also equipped with a forced air cooling system, and is compatible with a wide range of gas and process radicals. Its modular nature ensures easy maintenance and service, and its robust construction ensures reliable operation and extended lifecycle. Overall, TEL / TOKYO ELECTRON Alpha 803SD is a high-performance diffusion furnace that is highly reliable and efficient, and is suitable for many applications. Its modular design allows for easy installation and maintenance, while its advanced safety features guarantee safe operation. Its wide temperature range, uniformity control, and large chamber make it ideal for many types of diffusion processes.
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