Used TEL / TOKYO ELECTRON Alpha 805C #293756811 for sale

TEL / TOKYO ELECTRON Alpha 805C is a diffusion furnace with a variety of accessories for the controlled heating and etching of substrates. The main chamber is pressurized and split up into two separate heated zones for maximum accuracy and control of the process conditions. The main chamber is equipped with two independently controllable heating elements, so that two different process temperatures can be maintained in the main chamber and in the auxiliary chamber respectively. The main chamber features two manually adjustable shelves and an adjustable gas injection port. The auxiliary chamber features a manually adjustable pressure sensor and a gas exhaust pipe. TEL Alpha 805C diffusion furnace is powered by a single phase power supply of AC 200V/220V or 50/60 Hz, and it is equipped with multiple safety features. An over-temperature warning LED indicator and buzzer alert the operator in case of any abnormal conditions. TOKYO ELECTRON Alpha 805C has an intuitive LCD graphical panel display for easy tracking of the process conditions. The display also features process recipe data storage and enables easy monitoring of key process parameters. It also provides precision temperature set-points and temperature maintenance during the entire process, enabling accurate and consistent diffusion treatments. Alpha 805C diffusion furnace features multiple accessories for the etching and deposition of thin films. These include etching baskets for containing substrates, quartz liners for controlling the etching rate, and hanging rods for adjusting the distance between the substrates. It also comes with various gas inlet fittings for etching and deposition processes. TEL / TOKYO ELECTRON Alpha 805C is also equipped with a variety of accessories for monitoring and controlling the etching process. The accessory selection includes oxygen and argon gas flow meters and control valves, thermocouples, as well as an automated PID controller. TEL Alpha 805C diffusion furnace is capable of repeatable, high-precision thermal treatments and etching processes. It is designed for use in high volume, repeatable etching processes and is suitable for functioning in high-vacuum process environments. This diffusion furnace delivers reliable and accurate results and can be used in a wide range of industrial, laboratory, and educational settings.