Used TEL / TOKYO ELECTRON Alpha 805C #293775688 for sale
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TEL / TOKYO ELECTRON Alpha 805C is a sophisticated diffusion furnace and accompanying accessories that enable processing of semiconductor materials. It is powered by a state-of-the-art 333M large capacity, ultra-high speed, highly responsive controller for a variety of nitride and polysilicon processes. The equipment is designed for both P-type and N-type diffusion and includes multiple automated processes. TEL Alpha 805C is highly reliable and provides excellent uniformity and product quality, which is critical for quality assurance during semiconductor production. It is a highly customizable solution, with features such as rapid thermal processing, in-situ oxidation and P-type doping. It offers a wide temperature range of up to 1300°C, as well as multiple ramp rates to maximize throughput. TOKYO ELECTRON Alpha 805C also offers a wide range of process control capabilities, including control over chamber pressure and heat transfer coefficients. The gas management system consists of a uniform rinsing pump and a coolant pump to provide a uniform environment for highly accurate, repeatable processes. It also includes an advanced temperature program, which can select the most appropriate profile for the application. Alpha 805C features a variety of accessories for increased work efficiency. It includes manipulators, such as a wafer (heat sink) lift, a loader/unloader, and a temperature programmer. It also includes an advanced chamber cleaning unit for maintenance and a gas management machine for improved safety. Additionally, TEL / TOKYO ELECTRON Alpha 805C accessories include an on-board controller for process integration. TEL Alpha 805C is easy to install and manage and is ideal for production environments. Technical support is provided by skilled and certified technicians with concentrations in process development and thermal control technology. TOKYO ELECTRON Alpha 805C offers an affordable and efficient option for producing quality semiconductor components.
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