Used TEL / TOKYO ELECTRON Alpha 805CN #293622211 for sale

TEL / TOKYO ELECTRON Alpha 805CN is a diffusion furnace and accessories designed specifically for the production of semiconductors. TEL Alpha 805CN offers high productivity and improved equipment efficiency to meet the demands of modern semiconductor production. It is capable of supporting rapid throughput, allowing operators to produce more products while keeping costs low. TOKYO ELECTRON Alpha 805CN includes a variety of components and features, such as temperature control and processing, as well as pressure and monitoring systems. The temperature control system ensures accurate and uniform temperature during the entire process, while the processing and monitoring systems enable precise and consistent wafer fabrication. Alpha 805CN provides uniform and repeatable process performance for repeatable thermal cycles. Its direct heating element allows for quick and accurate processing. The furnace is equipped with an oscillatory air pre-heater that evenly distributes the heat over the wafer surface and reduces non-uniformity. TEL / TOKYO ELECTRON Alpha 805CN also features a large uniform temperature homogeneity with a wide temperature range of 400 to 1400 C. This allows for fast, accurate and repeatable thermal processing uniformity. The furnace is further equipped with a high-accuracy quartz thermocouple measuring device, allowing for precise and consistent temperature monitoring. TEL Alpha 805CN also includes an integrated system which includes specialized software to monitor and control the furnace temperatures, as well as other inputs and outputs. These systems are able to maintain steady and uniform temperatures as well as optimize wafer production cycles. The software also provides systematic control and data collection system, ensuring an efficient and precise production. TOKYO ELECTRON Alpha 805CN is a diffusion furnace and accessories designed to meet the demands of semiconductor production. It offers precise temperature control and uniform temperature homogeneity, high productivity, and precise temperature control. It includes integrated software to monitor and control the process, as well as specialized systems for precise temperature monitoring and control. These features ensure precise and consistent wafer fabrication, helping to reduce non-uniformity.