Used TEL / TOKYO ELECTRON Alpha 805CN #293622217 for sale

TEL / TOKYO ELECTRON Alpha 805CN is a diffusion furnace designed for producing semiconductors. It is ideal for a variety of applications such as thermal oxidation, silicon nitride formation and junction oxidation. TEL Alpha 805CN is a heavy-duty diffusion furnace equipped with a vertical quartz tube, an in-situ mechanical dewaxing mechanism and an optional furnace gas manifold. The quartz tube is highly resistant to silicon wafer contamination and provides excellent thermal and process control. The tube is designed with a specially-shaped entrance, supported by two springs and heated by shower electrodes to promote better uniformity. The furnace gas manifold provides gas flow control, allowing for separate waste and inlet gases along with separate cooling and air pressure controls. It also features an independent switching of the main exhaust and recycling systems. The integrated mechanical dewaxer includes a specialized scrubbing equipment, which eliminates fugitive particles and contaminants. TOKYO ELECTRON Alpha 805CN is further equipped with TEL KVM-eXView (Know-how Valuable & Maintenance-enhanced eXtreme View), allowing operators to monitor wafer status, process conditions and maintenance conditions locally or remotely via web-based access. The furnace is designed for easy installation into a wide variety of environments. Additional features of Alpha 805CN include an auto-leveling tray-exchange system, an adjustable opening size and a floating charge unit in order to optimize process reliability. The selective oxidation process is controlled by TOKYO ELECTRON patented uniformity control (UC) machine, which helps to reduce stress and defects of metal wiring layers during LPCVD processes. TEL / TOKYO ELECTRON Alpha 805CN has a wide range of temperature uniformity and yield solutions. It provides superb uniformity performance over a wide range of process temperatures, including low temperature processes. It is also capable of handling higher temperatures over a limited range while maintaining excellent uniformity. The furnace is capable of sustaining temperatures up to 1,200°C with a uniformity of +/- 0.3°C/W. Overall, TEL Alpha 805CN is a powerful and reliable diffusion furnace that is ideal for producing semiconductors. It features a robust design, excellent thermal uniformity and comprehensive control features. Combined with its efficient waste removal and optional gas manifold, TOKYO ELECTRON Alpha 805CN is the perfect choice for any semiconductor manufacturing process.