Used TEL / TOKYO ELECTRON Alpha 805DN #293651972 for sale

TEL / TOKYO ELECTRON Alpha 805DN is a high performance diffusion furnace system that can be used for thermal processing of semiconductor and MEMS devices. This furnace is equipped with a low pressure nitride process and is suitable for performing a wide range of thermal processes, such as annealing, gettering, and active atmosphere processes. It has a maximum operating temperature of 1100°C, and a 1200°C maximum temperature capability when using optional chamber upgrade. TEL Alpha 805DN is capable of achieving temperatures up to 1000°C for short periods of time, within a few seconds of ramp-up times. It also provides easy access to the substrate, allowing for the manipulation of small parts in a safe and clean environment. Additionally, this system offers excellent uniformity of substrate temperatures and low power consumption. The furnace is composed of a robust stainless steel chamber, which comes with a high purity quartz window and a set of quartz lifting pins. The door of the chamber is made of an operable stainless steel material, which offers long service life. The lift pins are designed to help lay individual substrates onto the process wafer and promote uniform heating, which helps ensure consistent results during the thermal processes. In order to promote uniform temperature across the entire surface area of the substrate, TOKYO ELECTRON Alpha 805DN uses a high efficiency direct drive valve. This offers an easy-to-use and reliable mechanism to consistently control the process parameters and provide uniform results. It is designed to maintain the highest possible temperature uniformity when compared to other conventional furnaces. Alpha 805DN also comes with several accessories, including a powerful exhaust fan for efficient removal of undesirable gases, a wafer arm for holding a wafer in place during the process, and a high purity carbon dioxide inlet module for introducing the gas into the chamber. In order to facilitate proper gas flow, TEL / TOKYO ELECTRON Alpha 805DN is fitted with a pre-programmable atmosphere controller and a set of pressure control valves. These valves allow for precise and controlled programming of inlet and exhaust gases at different pressures. This system is also equipped with a long life ceramic insulation, which helps to ensure proper thermal efficiency and fast heating and cooling processes. Overall, TEL Alpha 805DN is an ideal solution for semiconductor manufacturing applications. It offers excellent process capability, high uniformity temperatures, and low power consumption, making this highly efficient furnace the perfect choice for thermal process needs.