Used TEL / TOKYO ELECTRON Alpha 808D #9026275 for sale

TEL / TOKYO ELECTRON Alpha 808D is a diffusion furnace and accessory used in semiconductor fabrication to move dopants and other contaminants between layers of a substrate. TEL Alpha 808D diffusion furnace offers superior thermal management capabilities for high throughput processes such as oxidation, pre-clean and epitaxy. The furnace is available in three module configurations: the Single, Double and Triple modules. The Single module design is suitable for use in medium- to low-volume production scenarios. The Double and Triple modules provide the necessary flexibility and scalability to match production needs. TOKYO ELECTRON Alpha 808D offers vertical construction with several integrated furnaces. The furnace offers up to 18 heated zone and five mass flow controllers (MFCs) and temperature control. The combined power control enables a wider temperature range for each zone with a maximum temperature of 2,000°C. The integrated system latency time of 3 msec helps to reduce losses and achieve improved temperature and particle uniformity. Alpha 808D diffusion furnace utilizes an industry standard design for interfaces and protocols. This allows it to be easily integrated into existing process tools and systems. The chassis-based architecture facilitates easy installation and maintenance. The furnace is designed for up to 65 kg loads, with the option of increased load capacity using an optional bottomside heating element. It can also accommodate a variety of substrate sizes such as 200mm, 150mm, and 125mm diameters. TEL / TOKYO ELECTRON Alpha 808D diffusion furnace is compliant with latest safety standards and provides a protective environment for both the user and the system. A wide range of extra features such as process tracking, exhaust feedback monitoring, pixel profiling and contamination control are available in the system. Overall, TEL Alpha 808D diffusion furnace and its related accessories offer a reliable, efficient and cost-effective way to process high throughput processes. It offers enhanced temperature uniformity and particle uniformity, plus excellent thermal management capabilities, making it an excellent choice for medium- to high-volume production.